題目 : Effective silicon production from SiCl4 source using hydrogen radicals generated and transported at atmospheric pressure
著者 : Yuji Okamoto,
Masatomo Sumiya, Yuya Nakamura, and Yoshikazu Suzuki
雑誌 : Science and Technology for Advanced Materials
掲載日時 : 2020年7月27日
DOI :
10.1080/14686996.2020.1789438