Research and development at this center
[Methods and technologies (synthesis and processing)]
The page for [Measurements and characterization]is here (Link)
The technologies used at this center can be broadly divided into synthesis/manufacturing technology and evaluation analysis technology.
This page specifically focuses on synthesis and processing methods.Method for measurements and characterization is at Measurements and characterization page.
There is also a wide range of synthesis and processing technologies. First, it is a means of obtaining the desired material by reacting or melting substances at high temperatures, using a so-called "furnace." On the other hand, it is a means of synthesizing materials at relatively low temperatures, that is, using chemical methods that can be imaged from beakers or flasks.It provides a means of synthesizing substances from liquids such as aqueous solutions. There are also processes that use liquids and do not involve a dissolution step. An example of this is the process of dispersing powder into a liquid. Dispersion processes are of great importance in materials synthesis.
Another method is to synthesize materials by depositing vaporized raw materials as solids on a substrate. This process of precipitating a solid phase from a gas phase is often used for high-purity synthesis in a vacuum environment. Furthermore, this center will utilize shape forming technology such as microfabrication technology for device formation.
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Solid and melt processes / high temperature processes
We will introduce manufacturing processes that use high temperatures, such as solid phase reactions and melt processes, at this center.
Bulk single crystal growth
It is a process that produces large single crystals from melted liquid at high temperatures.
Production of large, high-quality single crystals for optical applications using the pulling method
Group in charge:Optical Single Crystals Group:SHIMAMURA, Kiyoshi・VILLORA, Garcia・YUAN, Dongsheng
Single crystal growth using Bridgman method etc.
Group in charge:Optical Single Crystals Group:NAKAMURA, Masaru
Sintering
This is the process of creating ceramics by densifying powder at high temperatures.
Fabrication of transparent ceramics using sintering technology
Group in charge:Optical Ceramics Group:SUZUKI, Tohru
Group in charge:Polycrystalline Optical Material Group:MORITA, Koji
High temperature gas reaction
This is a synthesis method that involves reacting a solid at high temperature with a gas. A typical example is nitride synthesis using ammonia.
Synthesis of nitrides and oxynitrides through high-temperature reactions
Group in charge:Advanced Phosphor Group:TAKEDA, Takashi
Group in charge:Electro-ceramics Group:SUEHIRO, Takayuki・SEGAWA, Hiroyo
Group in charge:Amorphous Material Group:SEGAWA, Hiroyo
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We would like to introduce the liquid phase process at this center.
Colloid process
This is a process for controlling the behavior of fine particles dispersed in a liquid to bring out material properties.
Ceramic particle orientation control using field
Group in charge:Optical Ceramics Group:SUZUKI, Tohru
Production of photonic colloid sheets from suspensions
Group in charge:Nanophotonics Group:FUDOUZI, Hiroshi
Precipitation from solution
溶Solid-phase materials are synthesized by precipitating raw materials dissolved in a solvent.
Precipitation of nanoparticles with controlled particle shape from solution
Group in charge:Electro-ceramics group:SAITO, Noriko
Hydrothermal synthesis method: Crystal precipitation from aqueous solution in critical state
Group in charge:Optical Ceramics Group:NAKANE, Takayuki
Sol-gel method
Group in charge:Amorphous materials group:SEGAWA, Hiroyo
Electrochemical synthesis method
A synthesis method that induces chemical reactions and mass transport by applying an electric field to the interface between a solution and a solid.
Formation of film by anodic oxidation of metal
Group in charge:Amorphous materials group:SEGAWA, Hiroyo
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We will introduce vapor phase growth at this center.
Molecular beam epitaxy (MBE)
This is a process in which raw materials are vaporized in a vacuum and then deposited and crystallized on a wafer.
Formation of quantum dots and quantum wells
Group in charge:Semiconductor Epitaxial Structures Group:MANO, Takaaki・HTAKE, Akihiro・KAWAZU, Takuya
Crystal growth of nitride semiconductors
Group in charge:Electro-ceramics group:OGAKI, Takeshi
Chemical vapor deposition (CVD)
This is a process in which raw material molecules carried by a gas flow react on the substrate surface and precipitate and crystallize.
Formation of semiconductor thin film by vapor phase growth
Group in charge:Semiconductor Defect Design Group:TERAJI, Tokuyuki; WATANABE, Kenji
Group in charge:Ultra-wide Bandgap Semiconductors Group:KOIZUMI, Satoshi・LIAO, Meiyong
Hydride vapor phase epitaxy (HVPE)
This is a crystal growth method in which raw metal is transported onto a substrate as chloride gas and crystals are deposited on the substrate.
Group in charge:Ultra-wide Bandgap Semiconductors Group:OSHIMA, Yuichi
Pulsed laser deposition (PLD)
This is a thin film growth process in which raw materials evaporated by laser pulse irradiation are deposited and crystallized on a substrate wafer.
Formation of semiconductor thin films and dielectric thin films by PLD method
Group in charge:Electro-ceramics group:ADACHI, Yutaka; SHIMIZU, Takao; OHSAWA, Takeo
Group in charge:Nano Electronics Device Materials Group:NAGATA, Takahiro
sputtering deposition
Raw materials vaporized using plasma are deposited on a wafer to grow crystals and synthesize thin film crystals.
Formation of semiconductor thin films and dielectric thin films by sputtering method
Group in charge:Electro-ceramics group:SHIMIZU, Takao; OHSAWA, Takeo
Group in charge:Nano Electronics Device Materials Group:NAGATA, Takahiro
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Fabrication processes used in this center
Lithography
It is a process in which fine structures are formed on the surface of a wafer or thin film using pattern formation on a resist film using electron beams or light.
Formation of metamaterials by lithography
Group in charge:Nanophotonics Group:IWANAGA, Masanobu
Group in charge:Semiconductor Epitaxial Structures Group:MIYAZAKI, Hideki
Formation of waveguide type nonlinear optical element by lithography
Group in charge:Nanophotonics Group:KURIMURA, Sunao
Etching
This method uses acid/alkaline solutions, plasma, etc. to remove the sample surface by dissolving or evaporating it and giving it the desired shape.
Etching technology that does not use plasma
Group in charge:Ultra-wide Bandgap Semiconductors Group:OSHIMA, Takayoshi; IWANAGA, Masanobu
Strong magnetic field application
By applying a magnetic field to powder, etc., particle aggregation and orientation are controlled.
Particle motion control using magnetic fields
Group in charge:Optical Ceramics Group:HIROTA, Noriyuki; SUZUKI, Tohru
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