Methods（synthesis and processing） : NIMS/Research Center for Electronic and Optical Materials

Research and developmentat this center
Methods and technologies
synthesis and processing

The technologies used at this center can be broadly divided into synthesis/manufacturing technology and evaluation analysis technology.
This page specifically focuses on synthesis and processing methods.Method for measurements and characterization is at Measurements and characterization page.

There is also a wide range of synthesis and processing technologies. First, it is a means of obtaining the desired material by reacting or melting substances at high temperatures, using a so-called "furnace." On the other hand, it is a means of synthesizing materials at relatively low temperatures, that is, using chemical methods that can be imaged from beakers or flasks.It provides a means of synthesizing substances from liquids such as aqueous solutions. There are also processes that use liquids and do not involve a dissolution step. An example of this is the process of dispersing powder into a liquid. Dispersion processes are of great importance in materials synthesis.

Another method is to synthesize materials by depositing vaporized raw materials as solids on a substrate. This process of precipitating a solid phase from a gas phase is often used for high-purity synthesis in a vacuum environment. Furthermore, this center will utilize shape forming technology such as microfabrication technology for device formation.
We also have equipment available for use by outside organizations. If you are interested, please inquire.

【Measurements and characterization】page is here

Solid and melt

Solid and melt processes / high temperature processes
We will introduce manufacturing processes that use high temperatures, such as solid phase reactions and melt processes, at this center.

Bulk single crystal growth

It is a process that produces large single crystals from melted liquid at high temperatures.

Production of large, high-quality single crystals for optical applications using the pulling method

Group in charge
Optical Single Crystals Group
SHIMAMURA, Kiyoshi VILLORA, Garcia YUAN, Dongsheng

Single crystal growth using Bridgman method etc

Group in charge
Optical Single Crystals Group
NAKAMURA, Masaru

Sintering

This is the process of creating ceramics by densifying powder at high temperatures.

Fabrication of transparent ceramics using sintering technology

Group in charge
Optical Ceramics Group
SUZUKI, Tohru

Group in charge
Polycrystalline Optical Material Group
MORITA, Koji

High temperature gas reaction

This is a synthesis method that involves reacting a solid at high temperature with a gas. A typical example is nitride synthesis using ammonia.

Synthesis of nitrides and oxynitrides through high-temperature reactions

Group in charge
Advanced Phosphor Group
TAKEDA, Takashi

Group in charge
Electro-ceramics Group
SUEHIRO, Takayuki

Group in charge
Amorphous Material Group
SEGAWA, Hiroyo

Liquid and powder

We would like to introduce the liquid phase process at this center.

Colloid process

This is a process for controlling the behavior of fine particles dispersed in a liquid to bring out material properties.

Ceramic particle orientation control using field

Group in charge
Optical Ceramics Group
SUZUKI, Tohru

Production of photonic colloid sheets from suspensions

Group in charge
Nanophotonics Group
FUDOUZI, Hiroshi

Precipitation from solution

Solid-phase materials are synthesized by precipitating raw materials dissolved in a solvent.

Precipitation of nanoparticles with controlled particle shape from solution

Group in charge
Electro-ceramics Group
SAITO, Noriko

Hydrothermal synthesis method: Crystal precipitation from aqueous solution in critical state

Group in charge
Optical Ceramics Group
NAKANE, Takayuki

Sol-gel method

Group in charge
Amorphous Material Group
SEGAWA, Hiroyo HAYASE, Gen

Electrochemical synthesis method

A synthesis method that induces chemical reactions and mass transport by applying an electric field to the interface between a solution and a solid.

Formation of film by anodic oxidation of metal

Group in charge
Amorphous Material Group
SEGAWA, Hiroyo

Vapor and vacuum

We will introduce vapor phase growth at this center.

Molecular beam epitaxy (MBE)

This is a process in which raw materials are vaporized in a vacuum and then deposited and crystallized on a wafer.

Formation of quantum dots and quantum wells

Group in charge
Semiconductor Epitaxial Structures Group
MANO, Takaaki OHTAKE, Akihiro KAWAZU, Takuya

Crystal growth of nitride semiconductors

Group in charge
Amorphous Material Group
OGAKI, Takeshi

Chemical vapor deposition (CVD)

This is a process in which raw material molecules carried by a gas flow react on the substrate surface and precipitate and crystallize.

Formation of semiconductor thin film by vapor phase growth

Group in charge
Semiconductor Defect Design Group
TERAJI, Tokuyuki WATANABE, Kenji

Group in charge
Ultra-wide Bandgap Semiconductors Group
KOIZUMI, Satoshi LIAO, Meiyong

Hydride vapor phase epitaxy (HVPE)

This is a crystal growth method in which raw metal is transported onto a substrate as chloride gas and crystals are deposited on the substrate.

Group in charge
Ultra-wide Bandgap Semiconductors Group
OSHIMA, Yuichi

Pulsed laser deposition (PLD)

This is a thin film growth process in which raw materials evaporated by laser pulse irradiation are deposited and crystallized on a substrate wafer.

Formation of semiconductor thin films and dielectric thin films by PLD method

Group in charge
Electro-ceramics Group
ADACHI, Yutaka SHIMIZU, Takao OHSAWA, Takeo

Group in charge
Nano Electronics Device Materials Group
NAGATA, Takahiro

sputtering deposition

Raw materials vaporized using plasma are deposited on a wafer to grow crystals and synthesize thin film crystals.

Formation of semiconductor thin films and dielectric thin films by sputtering method

Group in charge
Electro-ceramics Group
SHIMIZU, Takao OHSAWA, Takeo

Group in charge
Nano Electronics Device Materials Group
NAGATA, Takahiro

Machining and micro-fab

Fabrication processes used in this center

Lithography

It is a process in which fine structures are formed on the surface of a wafer or thin film using pattern formation on a resist film using electron beams or light.