施設・装置Facilities
FIB 加工装置 (JEM-9310FIB) Focused Ion Beam system
技術代行 試料作製装置
[設置部屋] 千現地区 精密計測実験棟212室/Room212, Physical Analysis Laboratories Building
[メーカー]日本電子
| Model: JEM-9310FIB | |
|---|---|
| Specifications | |
| Ion Source | Ga liquid-metal source |
| Acc. Voltage | 5 to 30 kV (5kV step variable) |
| Resolution | 8nm (30kV) |
| Max.Current | 10nA (30kV) |
| Magnification | ×150～300,000 (LOW MAG ×50) |
| Attachments | |
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・Protection layer deposition (Carbon) ・Sample holders : TEM-compatible holder ・FIB bulk-specimen holder Max:20×20×20(thickness)mm ・Bulk-sample holder (Max:8×8×1(thickness)mm) |
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