Jul. 13, 2026
Takashi Onaya, Researcher received the ALD Young Investigator Award at the ALD/ALE 2026.
The AVS 26th International Conference on Atomic Layer Deposition (ALD 2026) featuring the 13th International Atomic Layer Etching Workshop (ALE 2026) was held from June 28 to July 1, 2026. The conference was dedicated to the science and technology of atomic layer deposition of thin films and atomic layer etching.
The ALD Young Investigator Award recognizes outstanding early-career researchers who deliver oral presentations at the conference and received their Ph.D. degree within the past ten years.
Takashi Onaya, Researcher, received the ALD Young Investigator Award in recognition of his outstanding research achievements and excellent oral presentation.
Participation in the conference also provided valuable opportunities to exchange ideas with leading researchers from around the world, gain new insights into the latest advances in atomic layer deposition and etching technologies, and foster future scientific collaborations.
| Prize Category | ALD Young Investigator Award |
|---|---|
| Title |
Design of Interface Formation Process for Superior Ferroelectricity and Enhanced Fatigue Resistance in HfxZr1-xO2-Based Ferroelectric |
| Ceremony Date | July 1, 2026 |