FIB加工装置
Focused Ion Beam System
JEM-9310FIB (JEOL)
千現地区 精密計測実験棟 212室
| Ion Source | Ga liquid-metal source |
| Acc. Voltage | 5 to 30 kV (5 kV step variable) |
| Resolution | 8nm (30 kV) |
| Max. Current | 10 nA (30 kV) |
| Magnification | ×150～300,000 (LOW MAG ×50) |
| Attachments | Protection layer deposition (Carbon) Sample holders : TEM-compatible holder FIB bulk-specimen holder Max:20×20×20(thickness)mm Bulk-sample holder (Max:8×8×1(thickness)mm) |