Sep. 5, 2024
The group members, Takashi Onaya Visiting Researcher (The University of Tokyo, Research Associate), Toshihide Nabatame Specially Appointed Researcher, Tomomi Sawada Technical Staff in Thin film electronics group and other researchers have been awarded the "JSAP Silicon Technology Division Paper Award" at the 71st JSAP Spring Meeting 2024.
The Silicon Technology Division focuses not only on Silicon materials but also on any materials that enhance integrated circuit technology, which is essential for achieving Society 5.0 and the SDGs. This award recognizes authors whose work in silicon technology holds significant academic value.
This group member was highly evaluated based on the original idea about ferroelectricity for the long term.
| Prize Category | "JSAP Silicon Technology Division Paper Award" |
|---|---|
| Title | Wake-up-free properties and high fatigue resistance of HfxZr1−xO2-based metal–ferroelectric–semiconductor using top ZrO2 nucleation layer at low thermal budget (300 °C) |
| Journal | APL Materials |
| Authors | Takashi Onaya, Toshihide Nabatame, Mari Inoue, Tomomi Sawada, Hiroyuki Ota, Yukinori Morita |
| DOI | https://doi.org/10.1063/5.0091661 |
| Date | March 23, 2024 |