デュアルビーム加工観察装置
Dual Beam System
NB5000 (Hitachi High-Tech)
集束イオンビーム(FIB) 加工と走査型電子顕微鏡観察(SEM) が可能な装置です。SEMで観察しながらFIB加工が可能です。他機能として、EDSやSTEM、Mill＆Monitorが可能です。またカラム内で加工薄片をマイクロサンプリングすることが出来ます。
This is a Dual Beam system, which is equipped with focused ion beam (FIB) and scanning electron microscope (SEM), and besides, EDS, STEM and Mill & Monitor functions can be used. In addition, the processed sample can be micro-sampled in the column.
| Specifications | |
|---|---|
| Beam | Ga ion and electron beams |
| Attached functions | STEM, EDS, micro-sampling |
| FIB | Acc.Volt. 1～40 kV, max.current 50 nA, Magnification x600～ |
| SEM | Acc. Volt. 0.5～30 kV, resolution 1 nm@15kV, Magnification x250～ |
| Depo. Material | I-depo:W and C / E-depo: C |
| Sample Size | Less than 30 mm in diameter and 15 mm in thickness |
| Tilt angle | Eucentric Stage: -1.5～58°/ Side Entry Stage: ±60° |
| Images |  (STEM images) |
