Specifications | |
---|---|
Acc. Voltage | 200 kV, 80 kV, 60 kV with a Cold FEG and 2 Cs correctors (CL and OL) |
Resolution | Point 0.11 nm / Lattice0.07 nm (TEM mode) 0.08nm (STEM mode) |
Sample Tilting Angle | X / Y=±35° / ±30° |
Observation/Analysis Functions | EELS analysis: GATAN Quantum (200 kV, 80 kV, 60 kV) EDS: Dual SDD Type (Detection surface area 2 × 100 mm2; Solid angle 1.96 sr=2 × 0.98 sr) Electron holography: Wave-front separation holography by use of an electron biprism Tomography |
Images | ![]() 試料としてαタイプSiNを用いた。処理を施したNマップを見ると、強度は確かにNサイトで高くなっていることがわかる。一般にEDSは軽元素には不向きといわれているが、結晶性試料のようにチャネリングが利用できる場合原子分解能においても全く不可能でないことが分かる。 The specimen used is an a-type SiN. You can see from the processed N map, that the strength is certainly stronger on the N site. Typically, it is said that EDS is not suited for light elements, but if channeling can be used as in the case of crystalline samples, EDS analysis is not impossible even for atomic resolutions. |