Facilities
Group facilities for preparation and characterization
See an equipment list in Facilities in 2D Quantum Materials Group
More on facilities
- CW tunable Ti:sapphire laser with a tunable wavelength of 700-1000 nm
- He-Ne laser, solid state lasers with wavelengths of 1550, 1310, 532, and 304 nm
- Visible CCD detector and spectrometer
- He flow cryostat
- Microscopes with motorized stages
- Photochemical reactor
Capabilities
- Photoluminescence spectroscopy
- Time-resolved photoluminescence
- Photon correlation (HBT interferometry)
- Differential reflection
- Raman spectroscopy
- Photocurrent spectroscopy and spatial mapping
Shared facilities
NIMS Nanofabrication Facility
Nanoscale electronic devices can be fabricated using a shared microfabrication cleanroom at NIMS.
- Lithography: Advanced electron beam and photolithography for high-precision patterning.
- Deposition: Thin film deposition via sputtering, CVD, and ALD.
- Etching: Reactive ion etching (RIE) and ion milling for fine material removal.
- Characterization: High-resolution imaging and metrology for nanoscale structures.