Japanese page is here.
Japanese page is here.
This microscope is used to perform microspectroscopy and photoluminescence imaging. Measurements at cryogenic temperature are possbile.
A visible laser beam with arbitrary wavelength can be prepared with a supercontinuum light source and a spectrometer.
This spectrometer is used for microspectroscopy measrements.
This system is used to measure FET properties of devices fabricated. Measurements down to 10 K is possible.
A simple probe station to check device properties
Transport measurements at 4 〜 300 K and 0 〜 6 Tesla are possible.
For electrical measurements: nanovoltmeters, AC/DC current sources, electrometers, multimeters, lock-in amplifiers
Layer thickness of 2D materials can be evaluated.
TEM equipped with EDX, EELS, CCD cameras. TEM observations, electron diffractions, elemental analyses are possible.
MBE growth of various 2D materials are possible. E-beam heating, K-cells, evaporators are used to supply various sources.
In addition to evaporators and K-cells, RHEED is available to monitor crystal growth.
A cold-wall MOCVD chamber for crystal growth of 2D materials. Sources are supplied from top of the chamber as vapor, and the source supply can be controlled automatically by a valve on/off system.
A three-furnace CVD chamber for crystal growth of TMD-based 2D materials
Fine patterns can be fabricated with focused electron beam. This is an indispensable setup for device fabrications.
Home-built vacuum deposition system. This is used for deposition of electrodes.
Home-built plasma clearner for removal of amorphous carbon impurities
This spin coater is mainly used to coat a resist layer for the lithography process.
This is used to make electrical contacts to devices fabricated.
