Press Release 2010
Development of World’s Highest Performance Thin Film Condenser
A new high-k dielectric nanosheet with a molecular level thickness (~1.5 nm) has been discovered. Using this new material, the world’s highest performance thin-film condenser has been successfully developed by a solution-based bottom-up nanotechnology.
![Figure, thin-film condense](/mana/news_room/press/2010/t363dl0000000fg6-img/20100824_osada-fig.png)