External Project
LSTC: Leading-edge Semiconductor Technology Center (LSTC) is promoting three NEDO research and development projects related to cutting-edge semiconductor technology.
- LSTC：NEDO Project
As semiconductor miniaturization approaches new limits, establishing a domestic foundation for next-generation manufacturing technologies has become an urgent priority for Japan’s semiconductor industry. To address this challenge, LSTC is a technical research association promoting three NEDO research and development projects focused on cutting-edge semiconductors.
NIMS is participating in the theme “Technology Development for Beyond 2nm and Short TAT Semiconductor Manufacturing,” and is responsible for developing Si-based device, material, and process element technologies for nodes finer than 2nm, as well as short TAT and clean process equipment technologies. Researchers from both the FEOL and BEOL fields are involved, leveraging our strengths in materials science to drive innovation in manufacturing processes.
Technology Development for Beyond 2nm and Short TAT Semiconductor Manufacturing
Developing Si-based elemental technologies for devices, materials, and processes for features finer than 2 nm, as well as short-TAT and clean process equipment technologies
NIMS Participants
FEOL (Front End of Line)
FEOL (Front End of Line)- Toshihide Nabatame
- Kazuhito Tsukagoshi
- Takashi Onaya
- Seiichi Kato
- Naoki Fukata
- Wipakorn Jevasuwan
BEOL（Back End of Line）関係
BEOL（Back End of Line）関係- Akitsu Shigetou
- Akimitsu Ishii
- Yuma Iwasaki
- Ryoji Sahara
- Tadakatsu Ohkubo