MEMRISYS 2021 - Conference Committees

HONORARY CHAIR

  • Leon Chua (University of California, Berkeley)

CONFERENCE CHAIRS

  • Masakazu Aono (National Institute for Materials Science)
  • Kazuya Terabe (National Institute for Materials Science)
  • Tsuyoshi Hasegawa (Waseda University)

INTERNATIONAL STEERING COMMITTEE
(alphabetical order)

  • Masakazu Aono (National Institute for Materials Science)
  • Leon Chua (University of California, Berkeley)
  • Julio Georgiou (University of Cyprus)
  • Daniele Ielmini (Politecnico di Milano)
  • Ming Liu (Institute for Microelectronics, Chinese Academy of Science)
  • Wei Lu (University of Michigan, USA)
  • Themis Prodromakis (University of Southampton)
  • Sabina Spiga (Institute for Microelectronics and Microsystems, CNR)
  • Kazuya Terabe (National Institute for Materials Science)
  • Ronald Tetzlaff (Technische Universität Dresden)
  • Ilia Valov (Forschungszentrum-Jülich-JARA)
  • Huaqiang Wu (Tsinghua University)
  • Joshua Yang (University of Southern California)

INTERNATIONAL ADVISORY COMMITTEE
(alphabetical order)

  • Hiroyuki Akinaga (National Institute of Advanced Industrial Science and Technology)
  • Toyohiro Chikyow (National Institute for Materials Science)
  • Chun-Wei Chen (National Taiwan University)
  • Leon Chua (University of California, Berkeley)
  • James K. Gimzewski (University of California, Los Angeles)
  • Masanori Hashimoto (Kyoto University)
  • Hiroyuki Kaneko (Japan Science and Technology Agency)
  • Takeo Matsuki (National Institute of Advanced Industrial Science and Technology)
  • Takayasu Sakurai (The University of Tokyo)
  • Takayoshi Sasaki (National Institute for Materials Science)
  • Jaw-Shen Tsai (Tokyo University of Science)
  • Rainer Waser (RWTH Aachen)
  • Satoshi Watanabe (The University of Tokyo)
  • R. Stanley Williams (Texas A&M University)
  • Naoki Yokoyama (Honorary Fellow, Fujitsu Laboratories Ltd.)
  • Shigeaki Zaima (Meijo University)

LOCAL ORGANIZING COMMITTEE
(alphabetical order)

  • Hiroyuki Akinaga (National Institute of Advanced Industrial Science and Technology)
  • Masakazu Aono (National Institute for Materials Science)
  • Tsuyoshi Hasegawa (Waseda University)
  • Tomonobu Nakayama (National Institute for Materials Science)
  • Hisashi Shima (National Institute of Advanced Industrial Science and Technology)
  • Kazuya Terabe (National Institute for Materials Science)
  • Takashi Tsuchiya (National Institute for Materials Science)
  • Tohru Tsuruoka (National Institute for Materials Science)

TECHNICAL PROGRAM COMMITTEE
(alphabetical order)

  • Megumi Akai-Kasaya (Osaka University)
  • Masashi Aono (Keio University)
  • Masashi Arita (Hokkaido University)
  • Tetsuya Asai (Hokkaido University)
  • Xin Guo (Huazhong University of Science and Technology)
  • Taro Hitosugi (Tokyo Institute of Technology)
  • Cheol Seong Hwang (Seoul National University)
  • Teruo Kanki (Osaka University)
  • Jeehwan Kim (Massachusetts Institute of Technology)
  • Kentaro Kinoshita (Tokyo University of Science)
  • Katsunori Makihara (Nagoya University)
  • Stephan Menzel (Forschungszentrum Jülich)
  • Paolo Miani (University of Milano)
  • Takumi Mikawa (Nuvoton Technology Co. Japan)
  • Tomonobu Nakayama (National Institute for Materials Science)
  • Yoshifumi Nishi (Toshiba Corporation)
  • Yusuke Nishi (National Institute of Technology, Maizuru College)
  • Toshitsugu Sakamoto (NanoBridge Semiconductor, Inc.)
  • Akihito Sawa (National Institute of Advanced Industrial Science and Technology, Japan)
  • Da-shan Shang(Institute of Microelectronics, Chinese Academy of Science)
  • Shoso Shingubara (Kansai University)
  • Munehiro Tada (NanoBridge Semiconductor, Inc.)
  • Koichi Takase (Nihon University)
  • Hirofumi Tanaka (Kyushu Institute of Technology)
  • Wilfred G. van der Wiel (University of Twente)
  • Qiangfei Xia (University of Massachusetts, Armherst)
  • Marina Yamaguchi (Kioxia Corporation)

PUBLICATION COMMITTEE
(alphabetical order)

  • Hiroyuki Akinaga (National Institute of Advanced Industrial Science and Technology) (JJAP Special Issue, Chief Editor)
  • Azusa Hattori (Osaka University)
  • Kentaro Kinoshita (Tokyo University of Science)
  • Masaharu Kobayashi (University of Tokyo)
  • Daniele Ielmini (Politecnico di Milano)
  • Yusuke Nishi (National Institute of Technology, Maizuru College)
  • Munehiro Tada (NanoBridge Semiconductor, Inc.)
  • Takashi Tsuchiya (National Institute for Materials Science)
  • Tohru Tsuruoka (National Institute for Materials Science)
  • Qiangfei Xia (University of Massachusetts, Armherst)