Facility Map   Lab Equipment

Lab Equipment

Number：1　Super-Dry Room Room 501

Maker： Shinryo corporation Model： Special Use for： Battery cell assembly, evaluation of battery properties, analysis of battery materials. Outline： The world's highest level dry air is supplied with a dew point of < -90℃ (Water Content < 0.1ppm). The wide floor space of 80 m2 can accommodate 5 people working. 　Specification   Floor Area 80 m2 Dew point of supply air （Water Content) -90℃（≦0.1ppm） Capacity Max.5persons（Room Dew point is ≦-40℃ with 5 persons inside） Installed instruments Cell Assembly Equipment, Gas Transmission-rate Measuring Equipment, Viscometer、TG/MS, FTIR, Laser Raman Microscope, Ellipsometer, Compact SEM, Laser Microscope

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Number：2　Cell Assembly Equipment Room 501, 503, 504

Room 501 Vacuum Dryer Maker Yamato Scientific co.,Ltd. Use for Vacuum Dryer Ultrasonic Welder Maker Branson Use for Welding an electrode collector to a tab. Electrolyte Filling Booth Maker Yamato Scientific co.,Ltd. Use for 電解液の注液 Vacuum Sealer Maker Horsen Corp. Use for 電池作製のシーリング Crimper Maker Horsen Corp. Use for コインサイズ(2032用）の電池を封口 Roll Press Maker EAGER Corp. Use for Adjustment of the thickness and densification of the electrode Room 503 Mixer Maker Thinky Corp. Use for Mixing for active material, binding agent and solvent Coater Maker EAGER Corp. Use for Coat of the paste on the metal fiol of the electrode Dryer Maker Yamato Scientific co.,Ltd. Use for Drying of the coated electrode Room 504 Glove Box Maker VAC(Vaccum Atmospheres Company) Use for Cell Assemble and dismantling（Ar atomosphere/ Dew point ≦-75℃）

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Number：3　FTIR Room 501

Maker： Thermo Scientific Model： Nicolet iS50 Use for： Material characterization for qualitative and quantitative analysis Outline： The molecular structure is defined by measuring the absorption of the infrared radiations. Wavenumber resolution:0.09 ㎝-1. Scan speed:High scan rate(130 spectra/sec) Auxiliary： Infrared microscope, FT-Raman 　Specification   Wavenumver resolution 0.09cm-1 Range 200～12500cm-1 S/N Ratio 5000：1 Light Source Dual Source ・Polaris™ Long-lifetime mid-IR source（9600～20cm-1） ・Tungsten-Halogen NIR/Vis source（27000～2800cm-1） Detector ・DLaTGS-CsI（6400～200cm-1） ・DLaTGS-KBr（12500～350cm-1） Beamsplitter CsI（6400～200cm-1）/CaF2（13500～1200cm-1） Wavenumber Precision Optical Resolution, Mid-IR Better than 0.01cm-1 Less than 0.09cm-1

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Number：4　Laser Raman Microscope Room 501

Maker： Nanophoton Model： RamanTouch-VIS-NIR Use for： Identification of chemical bondings, crystallinity and/or deformation of crystal lattice. Outline： Information about molecular structure and crystalline structure of materials can be measured by analyzing the scattered light, which has a different wavelength from the incident light wavelength (Raman scattering). Spatial resolution (X axis) is 350 ㎚ Laser wavelengths are 488 ㎚,532 ㎚ (VIS) and 785 ㎚ (NIR) 　Specification   Laser wavelength 488 ㎚, 100mW/532 ㎚, 500mW/785 ㎚, 500mW Laser illumination method ・Point illumination ・Line illumination Scanning(X,Y) Laser beam scanning by galvanometer Scanning(Z) Motorized stage Spacial resolution (X / Y / Z) 350 ㎚ / 500 ㎚ / 1000 ㎚ Detector TE-cooled CCD 1348x400 pixel Spectrograph Focal length 500 ㎜ Grating selection 300, 600, 1200gr/mm. Slit width 20, 30, 50, 70, 100, 200 ㎛ Accuracy of peak position 0.1cm-1 Spectral resolution 1.2cm-1@785nm, 1200g/mm Object lens x5, x10, x20, x50, x100

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Number：5　Ellipsometer Room 501

Maker： J.A. WooLLAM Model： M-2000X Use for： The primary application of ellipsometry is to characterize film thickness, optical constants, band gap, alloy composition and phase structure. Outline： Ellipsometry measures a change in polarization as light reflects or transmits from a material structure. Ellipsometry is primarily used to determine film thickness and optical constants. However, it is also applied to characterize composition, crystallinity, roughness, doping concentration, and other material properties associated with a change in optical response. RCE (rotating compensator ellipsometer) technology to achieve high accuracy and precision, has an amplitude ratio (Ψ) of 0-90°, and a phase difference (Δ) of 0-360° with advanced CCD detection to measure all wavelengths simultaneously. 　Specification   Light source Xenon lamp Spectral Detection Rotating Compensator Ellipsometer Spectral Range 210-1000 ㎚, 480 wavelengths Angle of Incident Light 45°～90°

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Number：6　Transmission-rate Measuring Equipment Room 501

Maker： GL Sciences Model： GTME 2520 Use for： Gas transmission-rate measurement for films and materials. Outline： Gas transmission-rate measuring equipment with gas chromatograph based on JIS K 7126-2(Determination of gas-transmission rate -- Part 2: Equal-pressure method) Three types of detectors are installed, TCD, FID, and PDD. 　Specification   Detectors Gas chromatograph　2014　series (SHIMADZU Corp.) TCD,FID,PDD Test gases Mixtured gas, single gas Carrier gas He,Ar,N2 (choose depending on the test gas and detector) Cell temp. －20℃～80℃ Std. sample size φ74㎜　Max 1㎜ in thickness Gas transmission area 25cm2　φ56.5㎜ (Std. cell) Gas transmission-rate 0.1～3000cm3/（m2/24h/atm） (Single gas+PDD) 300cm3/（m2/24h/atm）～　（Single gas+TCD)

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Number：7　TG/MS Room 501

Maker： TA Instruments Model： Discovery Use for： Thermogravimetry (TG) of samples and mass spectrometry (MS) of outgases. Outline： The combination of TG and MS enables simultaneous analysis of the sample weight and the outgases. 　Specification   Balance type an underhung precision balance Temperature Range Ambient.-1200℃ Heating Rate Range 0.1 – 500 °C/min (linear) >2000 °C/min (ballistic) Furnace Cooling (Forced air/N2) 1200 to 35℃,<10min. Sample Weight Capacity 750mg Dynamic Weighing Range ±100mg Weighing Accuracy ±0.1% Weighing Precision ±0.01% Readability 0.001μg Sensitivity <0.1μg Short-term Noise (rms) <0.03μg Baseline Linearity (50-1000℃) <1μg Baseline Drift (50～1000℃,20℃/min. N2 purge, no baseline subtraction <10μg Detector Quadrupole mass spectrometer Mass range 1～300amu Mass Resolution >0.5amu Transfer line Temperature 300℃ Sensitivity 100ppb以下 Scanning Speed Bargraph Mode >50 amu/sec　Peak Jump Mode>64 channels/sec

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Number：8　Compact SEM Room 501

Maker： Agilent Technologies Model： 8500 Use for： Observation of the surface profile and structure. Outline： Compact FE-SEM settled in the dry room (resolution of 10 ㎚). Accelerating voltage is tunable (0.5-2 ㎸). Measurable without conductive pre-treatment. BEI (backscattered electron image) is possible. 　Specification   Gun Schottky-field emission electron gun Accelerating voltage 500～2,000V Probe current 0.2～1nA Resolution ＜10 ㎚（1 ㎸） Magnification x250～65,000 Detector SE,BSE,Topo Sample size 100x60㎜（max） Sample thickness 30㎜（max）

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Number：9　Laser Microscope Room 501

Maker： KEYENCE Model： VK-X200 Use for： Observation of the 3D profile and quantitative feature analysis. Outline： 3D laser scanning confocal microscope system performs nanometer level profile, roughness and thickness measurements on nearly any material. 　Specification   Total magnification x200～x24,000 Optical system for observation/measurement Pinhole confocal optical system Height measurement Display resolution 0.0005 ㎛ Measuring range 7㎜ Recording Function Pixel 2048x1536,1024x768,1024x64 Imaging（monochrome) 16bit Imaging（colour) 8bit Profile measurement 24bit Laser beam light source for measurement Wavelength 408nm(Violet Laser) Power 0.95mW Laser light-receiving element PMT（Photoelectron Multiplier Tube） Light source for optical observation Lamp 100W halogen lamp Colour camera for optical observation Imaging element 1/3" Colour CCD image sensor Recording resolution Super high resolution (3072×2304) Auto adjustment Gain, Shutter speed

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Number：10　Viscometer Room 501

Maker： AntonPaar Model： Lovis2000ME Use for： Combined measurement of density, dynamic viscosity and kinematic viscosity of liquids. Outline： Lovis 2000 M/ME is a rolling-ball viscometer which measures the rolling time of a ball through transparent and opaque liquids according to Höppler's principle. Sample volume is 0.1 mL to 0.8 mL. Measurable dynamic viscosity is up to 10,000 mPa·s with heating from 5 to 100℃. Test duration is a minimum of 30 seconds for 1 measurement. 　Specification   Dynamic viscosity 0.3～10,000mPa.s Temperature +5℃ to 100℃ Test duration minimal 30s, typical 3min Sample volume 0.1 to 0.8ml Inclination 15°to 80° in 1° steps Shear rate 0.5～1000s-1（influenced by capillary size and inclination）

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Number：11　Battery Charge/Discharge System Room 501

Maker： sai，Espec Model： 580（16ch）+ thermostatic chamber Use for： Evaluation of battery characteristics Outline： 5 terminal measurement is available. Voltage/current measurements of the cathode and anode are possible with 16 channels. The impedance measurement is possible at 1 kHz. The temperature is also controlled by PC. 　Specification   Set Voltage -2.000V to +10.000V Compliance Voltage -2.000V to +10.000V Maximum Current ±1.000A Current Ranges 1A, 100mA, 10mA, 1 mA, 100μA, 10μA (Auto) Mode Constant Current, Voltage or Power (charge, discharge) Environment -60～+150℃

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Number：12　Precision Electrochemical Measurement System Room 501

Maker： TOYO Corporation(Solartron Analytical), BioLogic Science Instruments Model： 12608W (1287 Electrochemical Interface + 1260 Electrochemical Interface), SP-200, VSP-300 (BioLogic Science Instruments) Use for： AC impedance and DC polarization measurements. Outline： 12608W manufactured by Solartron Analytical allows automatic measurement of AC impedance and DC Polarization. SP-200 is a portable potentiostat/galvanostat. VSP-300 is a modular‐unit potentiostat/galvanostat with 6 channels. 　Specification 12608W（Solartron)   周波数レンジ 10μHz～1MHz 電流レンジ 200nA～2A 電流検出抵抗 0.1Ω/1Ω/10Ω/100Ω/1kΩ/10kΩ/100kΩ/1MΩ 電流検出誤差 1kHz以下0.2％　10kHZ以下で1％　100kHz以下で2％ IR補正回路 電流遮断時間 27μS～1.36mS 周期の％ 0.4％～50％ 正帰還範囲 0～100％Rs リアルパート補正 0～100％Rs I/O RS423/232　110～9600baud GPIB　アドレッサブル VSP-300（BioLogic Science Instruments）   Current control range ±500mA, ±100mA, ±10mA, ±1mA, ±100μA, ±10μA, ±1μA (7ranges) Voltage control Ranges adjustable from ±10V down to ±30mV Impedance　Frequency range 10μHz to 7MHz Current Measurement Ranges ±500 mA, ±100 mA, ±10 mA, ±1 mA, ±100 μA, ±10 μA, ±1 μA Maximum resolution 0.0033% of range Ultra low current resolution 76pA External input 2 analog inputs/channel Slot 16 Slots SP-200（BioLogic Science Instruments）   Maximum current ±500mA Control voltage ±10V Impedance Frequency range ±500mA, ±100mA, ±10mA, ±1mA, ±100μA, ±10μA, ±1μA (7 ranges) Current Measurement　Ranges ±100pA, ±1nA, ±10nA, ±100nA Current Measurement Maximum Resolution 0.004% of the range (76aA max) Voltage measurement Ranges ±10V, ±5V, ±2.5V, ±250mV, ±25mV Voltage measurement Maximum resolution < 0.0033% of range External input 2 analog inputs/channel

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Number：13　Single-Particle Measurement System Room 101

Maker： Keyence, BioLogic Science Instruments, Micro Support Co.,Ltd Model： Combinations Use for： Characterization of a single particle of active material. Outline： A battery electrode is usually a composite of active materials, binders, and conducting agents. This system is used for characterization of individual active material particles in a battery electrode. The system consists of an optical microscope with high-resolution view, a micromanipulator, and a potentiostat/galvanostat/FRA for electrochemical measurements. 　Specification   Microscope VHX-2000-DE (Keyence) Micromanipulator Quick Pro (Micro Support) Electrochemical measurement SP-200 (BioLogic): Ultra Low current measuremnet equipped

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Number：14　ICP/MS Room 503

Maker： Agilent Technologies Model： Agilent 7700 ICP-MS Use for： Qualitative and quantitative analysis of trace elements. Outline： Using Inductively Coupled Plasma (ICP) as an excitation source, this mass analyzer (MS) with a high-frequency quadrupole provides superior ion transmission, resolution and abundance sensitivity and can measure a wide range of elements from Li to U, in a wide range of concentrations from ppt to ppm. The isotope ratio is also identifiable. 　Specification Plasma RF generator   RF generator free solid state digital drive 27 MHz RF generator with variable-frequency impedance matching RF power range 500W to 1600W, in steps of 10W. Mass Analyzer   Quadrupole mass spectrometer quadrupole with true hyperbolic rod profile, 【Mass range】2～260amu 【Mass scan speed】 　　Slew rate (Li to U, no intervening peaks): 56.6 million amu/s 　　Scan speed (Li to U, plus data collection at 40 intervening masses): > 3000 amu/s 【Abundance Sensitivity (at Cs)】Low Mass side 5ｘ10-7,　High Mass side 1ｘ10-7 Detector 【Minimum dwell time】100μs 【Dynamic Range】9orders

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Number：15　LC/MS Room 503

Maker： Waters Corp. Model： Xevo G2-S QTof Use for： Qualitative and quantitative analysis of solutions. Outline： Xevo G2-S QTof is high performance liquid chromatography combined with ion detection system of quadrupole mass spectrometry and time-of-flight mass spectrometry (UPLC/MS/MS). 　Specification   Mass measurement accuracy 1ppm Mass range m/z30～100,000 Resolving power 32,500FWHM Mass analyzer Mass range Quadrupole analyzer(MS1)+Orthogonal-acceleration time-of-flight (oaTof) analyzer(MS2) Ion Source Dual orthogonal pathway Ionization ESI，APCI Sample probe Solid，Liquid，Powder LC PH2-12 available

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Number：16　Ion Chromatography Room 503

Maker： Dionex Model： ICS-2100 Use for： Quantitative analysis of anions and cations. Outline： The ICS-2100 system is the first Reagent-Free™ ion chromatography system with electrolytic sample preparation (RFIC-ESP™ system) and eluent generation (RFIC-EG™ system) capabilities designed to perform all types of electrolytically generated isocratic and gradient IC separations using conductivity detection. Microbore 2 ㎜ columns and standard bore 4 ㎜ columns are fully supported. 　Specification   Pump Serial dual-reciprocating pistons, microprocessor-controlled constant stroke, variable speed 【Flow Rate Range】0.00–5.00 mL/min without changing pump heads 【Pressure Alarm Limits】35MPa 【Maximum Operating Pressure】21Mpa Detector Microprocessor-controlled digital signal processor Full-Scale Output Ranges Digital signal range 0～15000μS/cm Temperature Range Ambient +7℃, 30 to 55℃

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Number：17　O2, N2, H2 analyzer Room 504

Maker： HORIBA Model： EMGA Use for： Quantitative analysis of Oxygen, Nitrogen and Hydrogen. Outline： EMGA-930 is a simultaneous oxygen/nitrogen/hydrogen elemental analyzer with high accuracy and repeatability. The sample is rapidly heated up above the melting point in a He atmosphere, and the outgases are analyzed. 　Specification   Principle 【Oxygen determination】Non Dispersive Infrared detector (NDIR) 【Nitrogen determination】Thermal Conductivity Detector (TCD) 【Hydrogen determination】Non Dispersive Infrared detector (NDIR) Range 【Oxygen】0～5％（m/m） 【Nitrogen】0～3％（m/m） 【Hydrogen】0～0.25％（m/m） Sample weight 1g as standard condition, possible to decrease Sensitivity (Minimum reading) Oxygen/Nitrogen/Hydrogen: 0.001μg/g Furnace Impulse furnace with inert gas fusion with power variable from 0 to 8.0kw

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Number：18　GD-OES Room 504

Maker： HORIBA Model： GD-Profiler 2 Use for： Surface and depth analysis of the sample. Outline： GD-OES allows the analysis of elemental depth profiles by optical detection of emissions from the excited atoms after Ar plasma sputtering. Low damage and high resolution measurements can be realized by pulsed sputtering. Surface analysis of electrically non-conductive samples is possible by high frequency glow discharge. Bulk quantification of solid materials is also possible. 　Specification   Detector Photo-multipliers Spectroscope Polychromator (32 elements), Monochromator (1 wavelength) Lower limit of detection few10 ppm～ Analysis Depth surface～200 ㎛ Depth resolution nm range Sample electrically conductive and non-conductive samples Spot diameter φ4㎜

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Number：19　GC/MS Room 504

Maker： Agilent Technologies Model： Agilent 5977A GC/MS Use for： Qualitative and quantitative analysis of gases and liquids such as electrolytes. Outline： Qualitative analysis and quasi quantitative analysis is possible simultaneously by splitting the eluted spices from GC-column into MSD and FID. An EI source and CI source are available. Simultaneous SIM/Scan operation is possible. 　Specification   Mass range 1.6～1050 分解能 R>2M Max.Scan Speed 20,000u/sec Vacuum pump 255L/sec TMP

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Number：20　Mass Spectroscopy Room 504

Maker： JEOL Model： JMS-700 Use for： Identification of chemical species such as gases from a battery cell. Outline： The use of a 10 ㎸ ion source in combination with a post acceleration conversion dynode-based ion detector allows for effective detection of either positive or negative ions. A resolution exceeding 60,000 can easily be obtained. 　Specification   Resolving Power 60,000 (10%Valley) Sensitivity 200 pg of methyl stearate with an S/N≧400 or better in the EI mode. Highest Acceleration Voltage 10kV

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Number：21　XRF Room 505

Maker： SHIMADZU Model： LAB CENTER XRF-1800 Use for： Qualitative and quantitative analysis of elemental composition Outline： This system is capable of elemental analysis (except for H, He, Li, Be) with a 250 ㎛ scale by detecting the characteristic fluorescent X-rays emitted from each element within samples by X-ray irradiation. It enables to determine the elemental composition and obtain the elemental mapping of the sample surfaces. 　Specification   System Wavelength-dispersive X-ray spectroscopy X-ray tube 4kW thin-window X-ray tube of Rh Sample Loading System Swing-arm system from the turret position of 8 samples. Detectors Scintillation counter (SC)，Proportional counter (FPC) Analyzing crystals LiF(200)，PET，Ge，TAP，SX98，SX76，SX-54，SX-14

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Number：22　XPS Room 505

Maker： ULVAC-PHI Model： PHI 5000 VersaProbe II Use for： Surface-sensitive qualitative and quantitative analysis of elemental composition and oxidation states of surface species. Outline： This system is capable of determination of the elemental composition and oxidation state of surface species by analyzing photoelectrons emitted by X-ray excitation. A monomer Ar ion gun and gas cluster ion gun (GCIB) are available for depth-resolved analysis. Samples can be introduced from an inert environment into the vacuum chamber by transfer vessel. 　Specification   Min. X-ray beam micro-focused scanning x-ray source (Al Kα; 1486.6 eV, spot size; 10-300 mm) un-focused dual anode x-ray source (Mg Kα; 1254 eV and Zr Kα; 2042.4 eV Max.energy resolution 0.5eV>（Ag3d 5/2） High sensitivity 1,000kcps（Ag3d 5/2，FWHM 1.0eV） Degree of vacuum 6.7x10-8Pa≥ Arion gun and Ar gas cluster ion gun(GCIB) Ar+ ion and Ar2500+ cluster ion sources Sample stage Cooling/heating 5-axis tilt stage Transportation Non-atmospheric exposure analysis is availabnle with transfer-vessel.

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Number：23　HAXPES Room 505

Maker： Omicron NanoTechnology & ULVAC-PHI Model： Custom Engineered Product Use for： Photoelectron spectroscopy excited by hard X‐rays. Outline： This system is capable of elemental analysis of surface species by analyzing photoelectrons emitted by hard X-ray excitation. This system is equipped with a monochromatic micro-focused Cr Kα source. It enables chemical analysis of elements in a deeper region (> 10 ㎚) than conventional XPS. The system is connected to an Ar filled glove box to avoid moisture/air exposure of samples during transfer. 　Specification   X-ray source Monochromatic X-ray Source(target Cr) Energy resolu tion 70meV>(@100eV Pulse energy, 6keV Photoelectron)

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Number：24　XRD Room 505

Maker： Rigaku Model： SmartLab® Use for： Analysis of powder, thin film and SAXS Outline： SmartLab is equipped with a high luminance rotating anode generator, an optional in-plane diffraction arm for in-plane measurements without reconfiguration and focusing and parallel beam geometries. A high-temperature heating stage to 1100℃ in inert gas is available. 　Specification   Type Rotating anode generator Maximum rated output 9kW Optics Cu Target Powder diffraction, thin film diffraction, SAXS, in-plane scattering Focusing and parallel beam geometries Detector Scintillator NaI, photomultiplier with preamplifier

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Number：25　BET Room 504

Maker： Micromeritics Model： 3FLEX Use for： Measurement of surface area and pore volume for powder samples. Outline： A fully automated, three-station instrument with dedicated pressure transducer provides superior mesopore/micropore, physisorption, or chemisorption analysis. 　Specification   Sample Analysis Ports 3 ports(1, 2, or 3 micropore -capable ports) Minimum measurable surface area 0.01m2/g(nitrogen), 0.0005m2/g (krypton) Isothermal jacket Control 45℃+/-0.05℃ Sample Tubes Metric, flat bottom, 9 and 12㎜

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Number：26　Particle Size Analyzer Room 504

Maker： HORIBA Model： LA-950V2 MF Use for： Particle size distribution analysis Outline： The system is equipped with a dual-wavelength optical system, two light sources of 650 ㎚ (Laser) and 405 ㎚ (LED). The latest theories for data analysis and newly developed calculation algorithms provide for stable, high-quality analysis performance for all particle diameters. 　Specification   Measurement Method Mie Scattering Theory Measurement Range 0.01～1000 ㎛ Diepersion Medium Amount 35～55ml Optical System Light Source 650nm Laser Diode approx.5.5mW 405nm Light Emitting Diode(LED) approx.3.0mW Detectors Silicon Photo Diode Circulation System Dispersion Ultrasonic Probe Circulation Pump 15-Level selections Agitator 15-Level selections Floew/Fraction Cell Tempax Glass Oparating Temperature/Humidity 15-35℃/85%RH or less

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Number：27　Environment-controlled SPM Room 206-1

Maker： Bruker AXS Model： MultiMode 8 + Glove Box Use for： Topography (surface profile), nanomechanical property, quantitative conductivity mapping Outline： The MultiMode is the world’s most field-proven atomic force microscope (AFM), with a turnkey glove box which can control an environment in which both water and oxygen can be maintained at < 1 ppm. Using this AFM, the surface conditions of the electrode can be evaluated without exposure damage. 　Specification   General Imaging Modes Peak Force Tapping, Tapping Mode, Contact Mode, PhaseImagingTM, Torsional Resonance Mode, Lateral Force Microscopy, Scanning Tunneling Microscopy High-speed scan 256 points x 256 lines less than 1 min. Scanner 125 ㎛ x 125 ㎛ XY and 5 ㎛ Z range Maximum Sample Size 15㎜ diameter x 5㎜ thick

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Number：28　TOF-SIMS Room 102

Maker： ION-TOF GmbH Model： TOF.SIMS5-AD-GCIB Use for： Detection and identification of trace elements/compounds on the surface, depth profiling, and imaging with the sub-micron lateral resolution Outline： High sensitivity can be realized by mass spectrometry of secondary ions emitted by ion sputtering. Information on the molecular structure of organic compounds can be obtained under the static SIMS condition. Molecular depth profiling is possible with lower damage by using an Ar gas cluster ion beam (GCIB). 　Specification   The beam spot size 100nm (Imaging mode) Mass resolution M/ΔM＞10000 (Spectroscopy mode) Ultimate vacuum ＜6.7x10-8Pa Ar-GCIB Beam energy:2～20kev,　Cluster size:Ca.2500 Flooding O2 or Ar is available (Pressure automatically controlled) Heating and cooling systems -130～600℃(The sample stage with heating and cooling systems) Unexposing the sample to ambient air. Transfer vessel is available

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Number：29　TEM/STEM Room 105

Maker： JEOL Model： JEM-ARM200F（HR） Use for： TEM/STEM observation, EELS analysis, EDX analysis Outline： The JEM-ARM200F, with a STEM Cs corrector incorporated as standard, and the mechanical and electrical stability enhanced to the utmost limit, achieves an unprecedented STEM-HAADF resolution of 78 pm at 200 ㎸. The cold FEG enables high energy resolution EELS analysis. 　Specification Electron source   Gun type Schottky type-Cold Field Emission gun Accelerating voltage 60,80,200kV Resolution   Dark Field mode 78pm (at 200kV, with cold FEG) TEM(point resolution) 190pm (at 200kV )110pm (at 200kv, with TEM Cs-corrector) Magnification   STEM x200 to x150,000,000 TEM x50 to x2,000,000 その他   Cs-corrector Built-in as standard Detectors ・EDS ・EELS Specimen Holder The unexposuring sample tilting holder to ambient air is available. The unexposuring to ambient air and cryo sample holder is available(tilting holder)

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Number：30　FIB Room 105

Maker： JEOL Model： JIB-4501 Use for： Fine milling and TEM thin-film sample preparation. Outline： The JIB-4601F is a multibeam processing system with a thermionic SEM and a high-performance ion column. The high-power FIB column enables fast milling without any deterioration of the sample using the cryo-stage. The prepared TEM thin-film sample can be mounted to a mesh grid in the glove-box without exposure to ambient air. 　Specification FIB   Ion source Ga liquid metal ion source Accelerating voltages 1 to 30 kV (in 5 kV steps) Magnification x60 (for searching for a field) x200 to x300,000 x30 (for searching for a field) x100 to x300,000 Image resolution 5nm (at 30kV) Beam current Up to 60nA (at 30kV) SEM   Electron source LaB6 Accelerating voltages 0.3 to 30kV Magnification x5 to x300,000 Image resolution 2.5nm Beam current 1μA (at 30kV) Other   Specimen Holder The liquid N2-cooling　stage is available. The TEM thin-film sample can be mounted to the mesh grid in the glove-box without an exposure to ambient air.

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Number：31　FIB-SEM Room 108

Maker： Hitachi High-Tech Science Model： SMF2000 Use for： FIB processing, SEM/STEM observation, 3D image processing, EDS analysis, sample preparation for SEM/TEM. Outline： The ion source of FIB is set perpendicular to the electron source of SEM. The specimen after FIB processing can be observed by SEM without moving the stage and 3D image acquired automatically. Low damage FIB processing is possible with a cryo-stage. Processing without air exposure is possible. 　Specification FIB   Ion source Ga liquid metal ion source Accelerating voltages 1,2,3kV 5 to 30 kV (in 5kV steps) Area of the observation field 0.5 ㎛ ｘ 0.5 ㎛ ～ φ2㎜ Image resolution 4.0nm (at 30kV) Beam current Up to 90nA SEM   Electron source Thermal Field Emission gun(ZrO/W) Accelerating voltage 0.1 to 30kV (in 10kV steps) Area of the observation field 0.125 ㎛ ｘ 0.125 ㎛ ～ 2㎜ｘ2㎜（10kV） Image resolution 1.1nm(at 20kV) 1.5nm(at 10kV) 2.5nm(at 1kV) for SEM 0.8nm (at 30kV) for STEM Beam current Up to 10nA Detector STEM,BSE Low accelerating voltage Ar ion   Ion source Phillips Ionization Gauge(PIG) tpye ion source Accelerating voltages 0.5 to 1kV Beam current Up to 10nA Other   Detectors EDS Specimen Holder The atmosphere blocking holder is available.

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Number：32　SEM Room 108

Maker： JEOL Model： JSM-7800F Use for： SEM observation, EDS/WDS/EBSD measurement Outline： High resolution observation (0.8 ㎚ @15 ㎸, 1.2 ㎚ @1 ㎸) is possible with low acceleration voltage (0.01-30 ㎸). Soft x-ray emission from lithium can be detected using a newly developed WDS. Sample transfer without air exposure is possible. 　Specification   Resolution 0.8nm（15kV）,1.2nm（1kV）,3.0nm（15kV、5nA、WD10㎜） Magnification x25 to x1,000,000 Accelerting Voltage 0.01kV to 30kV Probe current Several pA to 200nA Detectors Upper Electron Detector（UED）, Lower Electron Detector（LED） Gentle beam Built-in Image display Image display area 1,280 x 960 pixel, 800 x 600 pixel Analizer ・Energy Dispersive X-ray Spectrometer (EDS) ・Wavelength Dispersive X-ray Spectrometer (WDS) ・Electron Backscatter Diffraction (EBSD) ・Soft X-Ray Emission Spectrometer (SXES) Specimen stage The cooling system is available Unexposing the sample to ambient air Transfer vessel is available

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Number：33　Scanning Auger Electron Spectroscopy Room 108

Maker： ULVAC-PHI Model： PHI710 Use for： Analysis of the element composition and chemical bonding state of the solid sample surface Outline： This system is capable of analyzing the elemental composition and chemical bonding state by irradiating a sample surface with a focused electron beam and analyzing the kinetic energy of the Auger electrons emitted from the surface. The analysis at high spatial resolution up to 8 nm and high magnification up to 500,000 is possible without a sample drift. Samples can be introduced into the analysis chamber from an Ar-filled glove box and/or a dry room via transfer vessel without moisture/air exposure. 　Specification   SEM spatial resolution ≤ 3nm (@25kV, 0.2nA) AES spatial resolution ≤ 8nm (@20kV, 1nA) Sensitivity 700kcps（CuLMM）@ 10kV，10nA Energy resolution 0.5%≥ (HR mode 0.1~0.5%) Degree of vacuum 6.7ｘ10-8Pa≥ Sample stage Cooling stage is available Transportation Non-atmospheric exposure analysis is availabnle with transfer-vessel.

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Number：34　Cross-section polisher Room 108

Maker： JEOL Model： IB-09020CP Use for： Preparation for pristine cross sections of a specimen for SEM and AES. Outline： The cross-section polisher is a device used to prepare pristine cross sections of a specimen using an ion beam and a shielding plate. The processing condition can be confirmed by monitoring the CCD camera in real time. A cooling system for the specimen stage is available. Non-atmospheric exposure analysis is possible with the transfer-vessel. 　Specification   Ion accelerating voltage 2 to 8kV Ion-beam diameter 500㎛ (full width at half maximum) Milling speed 300㎛/h @8kV (on a silicon substrate conversion basis) Specimen movement range X-axis: 10㎜ Y-axis: 3㎜ Specimen-rotation angle adjustment range ±5° Specimen-milling swing angle ±30° Transportation Non-atmospheric exposure analysis is availabnle with transfer-vessel.

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