Research and development at this center
[Methods and technologies (synthesis and processing)]
The page for [Measurements and characterization]is here (Link)
The technologies used at this center can be broadly divided into synthesis/manufacturing technology and evaluation analysis technology.
This page specifically focuses on synthesis and processing methods.Method for measurements and characterization is at Measurements and characterization page.
There is also a wide range of synthesis and processing technologies. First, it is a means of obtaining the desired material by reacting or melting substances at high temperatures, using a so-called "furnace." On the other hand, it is a means of synthesizing materials at relatively low temperatures, that is, using chemical methods that can be imaged from beakers or flasks.It provides a means of synthesizing substances from liquids such as aqueous solutions. There are also processes that use liquids and do not involve a dissolution step. An example of this is the process of dispersing powder into a liquid. Dispersion processes are of great importance in materials synthesis.
Another method is to synthesize materials by depositing vaporized raw materials as solids on a substrate. This process of precipitating a solid phase from a gas phase is often used for high-purity synthesis in a vacuum environment. Furthermore, this center will utilize shape forming technology such as microfabrication technology for device formation.
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Solid and melt processes / high temperature processes
We will introduce manufacturing processes that use high temperatures, such as solid phase reactions and melt processes, at this center.
Bulk single crystal growth
It is a process that produces large single crystals from melted liquid at high temperatures.
Production of large, high-quality single crystals for optical applications using the pulling method
Group in charge：Optical Single Crystals Group：SHIMAMURA, Kiyoshi・VILLORA, Garcia・YUAN, Dongsheng
Single crystal growth using Bridgman method etc.
Group in charge：Optical Single Crystals Group：NAKAMURA, Masaru
Sintering
This is the process of creating ceramics by densifying powder at high temperatures.
Fabrication of transparent ceramics using sintering technology
Group in charge：Optical Ceramics Group：SUZUKI, Tohru
Group in charge：Polycrystalline Optical Material Group：MORITA, Koji
High temperature gas reaction
This is a synthesis method that involves reacting a solid at high temperature with a gas. A typical example is nitride synthesis using ammonia.
Synthesis of nitrides and oxynitrides through high-temperature reactions
Group in charge：Advanced Phosphor Group：TAKEDA, Takashi
Group in charge：Electro-ceramics Group：SUEHIRO, Takayuki・SEGAWA, Hiroyo
Group in charge：Amorphous Material Group：SEGAWA, Hiroyo
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We would like to introduce the liquid phase process at this center.
Colloid process
This is a process for controlling the behavior of fine particles dispersed in a liquid to bring out material properties.
Ceramic particle orientation control using field
Group in charge：Optical Ceramics Group：SUZUKI, Tohru
Production of photonic colloid sheets from suspensions
Group in charge：Nanophotonics Group：FUDOUZI, Hiroshi
Precipitation from solution
溶Solid-phase materials are synthesized by precipitating raw materials dissolved in a solvent.
Precipitation of nanoparticles with controlled particle shape from solution
Group in charge：Electro-ceramics group：SAITO, Noriko
Hydrothermal synthesis method: Crystal precipitation from aqueous solution in critical state
Group in charge：Optical Ceramics Group：NAKANE, Takayuki
Sol-gel method
Group in charge：Amorphous materials group：SEGAWA, Hiroyo
Electrochemical synthesis method
A synthesis method that induces chemical reactions and mass transport by applying an electric field to the interface between a solution and a solid.
Formation of film by anodic oxidation of metal
Group in charge：Amorphous materials group：SEGAWA, Hiroyo
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We will introduce vapor phase growth at this center.
Molecular beam epitaxy (MBE)
This is a process in which raw materials are vaporized in a vacuum and then deposited and crystallized on a wafer.
Formation of quantum dots and quantum wells
Group in charge：Semiconductor Epitaxial Structures Group：MANO, Takaaki・HTAKE, Akihiro・KAWAZU, Takuya
Crystal growth of nitride semiconductors
Group in charge：Electro-ceramics group：OGAKI, Takeshi
Chemical vapor deposition (CVD)
This is a process in which raw material molecules carried by a gas flow react on the substrate surface and precipitate and crystallize.
Formation of semiconductor thin film by vapor phase growth
Group in charge：Semiconductor Defect Design Group：TERAJI, Tokuyuki; WATANABE, Kenji
Group in charge：Ultra-wide Bandgap Semiconductors Group：KOIZUMI, Satoshi・LIAO, Meiyong
Hydride vapor phase epitaxy (HVPE)
This is a crystal growth method in which raw metal is transported onto a substrate as chloride gas and crystals are deposited on the substrate.
Group in charge：Ultra-wide Bandgap Semiconductors Group：OSHIMA, Yuichi
Pulsed laser deposition (PLD)
This is a thin film growth process in which raw materials evaporated by laser pulse irradiation are deposited and crystallized on a substrate wafer.
Formation of semiconductor thin films and dielectric thin films by PLD method
Group in charge：Electro-ceramics group：ADACHI, Yutaka; SHIMIZU, Takao; OHSAWA, Takeo
Group in charge：Nano Electronics Device Materials Group：NAGATA, Takahiro
sputtering deposition
Raw materials vaporized using plasma are deposited on a wafer to grow crystals and synthesize thin film crystals.
Formation of semiconductor thin films and dielectric thin films by sputtering method
Group in charge：Electro-ceramics group：SHIMIZU, Takao; OHSAWA, Takeo
Group in charge：Nano Electronics Device Materials Group：NAGATA, Takahiro
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Fabrication processes used in this center
Lithography
It is a process in which fine structures are formed on the surface of a wafer or thin film using pattern formation on a resist film using electron beams or light.
Formation of metamaterials by lithography
Group in charge：Nanophotonics Group：IWANAGA, Masanobu
Group in charge：Semiconductor Epitaxial Structures Group：MIYAZAKI, Hideki
Formation of waveguide type nonlinear optical element by lithography
Group in charge：Nanophotonics Group：KURIMURA, Sunao
Etching
This method uses acid/alkaline solutions, plasma, etc. to remove the sample surface by dissolving or evaporating it and giving it the desired shape.
Etching technology that does not use plasma
Group in charge：Ultra-wide Bandgap Semiconductors Group：OSHIMA, Takayoshi; IWANAGA, Masanobu
Strong magnetic field application
By applying a magnetic field to powder, etc., particle aggregation and orientation are controlled.
Particle motion control using magnetic fields
Group in charge：Optical Ceramics Group：HIROTA, Noriyuki; SUZUKI, Tohru
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