Shun publishes his work on van der Waals decoration of ultra-high-Q silica microcavities in Nano Letters

Shun’s paper on van der Waals decoration of ultra-high-Q silica microcavities is published in Nano Letters. Congratulations!

This research introduces a hybrid photonic platform that allows flexible tuning of the balance between second- and third-order susceptibilities, key to optical nonlinear processes used in applications like ultrafast lasers and quantum technologies. By strategically placing atomically thin tungsten diselenide on ultra-high-Q silica microcavities, the team achieved coexistence of second- and third-order nonlinearities in a single device, paving the way for novel applications of hybrid systems with controlled nonlinear susceptibilities.

van der Waals Decoration of Ultra-High-Q Silica Microcavities for χ(2)–χ(3) Hybrid Nonlinear Photonics

Shun Fujii, Nan Fang, Daiki Yamashita, Daichi Kozawa, Chee Fai Fong, and Yuichiro K. Kato Nano Lett. 24, 14, 4209–4216 (2024). DOI: 10.1021/acs.nanolett.4c00273