Research 2010

Development of World’s Highest Performance Thin Film Condenser

Aug 24, 2010

This research was conducted by
Minoru Osada& Takayoshi Sasaki

A new high-k dielectric nanosheet with a molecular level thickness (~1.5 nm) has been discovered. Using this new material, the world’s highest performance thin-film condenser has been successfully developed by a solution-based bottom-up nanotechnology.


thin-film condenser


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