Research 2010
Development of World’s Highest Performance Thin Film Condenser
Aug 24, 2010
- This research was conducted by
- Minoru Osada& Takayoshi Sasaki
A new high-k dielectric nanosheet with a molecular level thickness (~1.5 nm) has been discovered. Using this new material, the world’s highest performance thin-film condenser has been successfully developed by a solution-based bottom-up nanotechnology.
