About us

For semiconductor device application in the next generation, our goal is to develop novel semiconductor nanomaterials integration technologies and semiconducting nanometer-scale devices by “the Best of Both Worlds”, i.e., Top-down approaches after the deposition of thin film materials and Bottom-up ones by direct crystal growth of nanomaterials.

What's new

  • Sep. 2, 2025
    We have launched our research group’s website. Thank you for your continued support. Our group is currently seeking postdoctoral researchers and graduate students who are interested in working with us on research and development. For more details, please see here.
  • Apr. 1, 2025
    I have joined NIMS and launched a new research group. With the aim of developing next-generation semiconductor nano-integration technologies, I will pursue research in close collaboration with colleagues both within and outside NIMS. I would greatly appreciate your continued guidance and support.

国立研究開発法人 物質・材料研究機構(NIMS)

半導体ナノ集積グループ

〒305-0044 茨城県つくば市並木1-1

Semiconductor Nano-integration Group

National Institute for Materials Science

1-1, Namiki, Tsukuba, Ibaraki 305-0044, Japan

Copyright © Semiconductor Nano-integration Group
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