12TH INTERNATIONAL WORKSHOP ON BEAM INJECTION ASSESSMENT OF MICROSTRUCTURES IN SEMICONDUCTORS - BIAMS 12
Tsukuba/Japan, June 22-26, 2014
Topics
The conference will be organized in sections with key lectures given by invited speakers on relevant scientific and technological topcs. Poster sessions will also be programmed.
The official language of the conference will be English.
The following main topics are included:
Semiconductor characterization methods
- •Electron beam characterization methods: cathodoluminescence, EBIC, TEM, STEM, EBSD, ...
- •Light characterization methods: spatially resolved PL, microRaman, OBIC, ...
- •Scanning Probe Microscopy: STM, AFM and SNOM techniques
- •Ion beams
- •Other microscopy characterization techniques
Application of these and related techniques to the study of
- •Photovoltaic materials and devices
- •Point and extended defects, impurities, interfaces ...
- •Heterostructures, quantum structures, devices ...
- •Nanostructures, nanowires ...
- •Optical and electronic properties of defects, microstructures and nanostructures and in general any quantitative and analytical aspect of local beam injection assessment of any semiconductor material.
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