Joint Workshop LANL/NIMS Quantum and Functional Materials and MANA International Symposium 2024


Nanomaterials - 01

Title

2D Zeolite Nanosheets: Exfoliation and Deposition as a Thin Layer

Author's photo

Authors

Ondřej Veselý, Nobuyuki Sakai, and Takayoshi Sasaki

Affiliations

Soft Chemistry Group, MANA, NIMS

URL

https://www.nims.go.jp/softchem/index-e.html

Email

vesely.ondrej@nims.go.jp

Abstract

Two-dimensional (2D) materials have gained significant attention due to their distinct properties, because they can be exfoliated and deposited to form thin films or composite structures.[1]  Among these materials, 2D zeolites stand out for their large surface area, chemical stability, and catalytic applications. However, exfoliating their parent layered zeolites has been notoriously challenging.[2]   We utilized a soft chemical process to exfoliate layered zeolites, such as MCM-56 (MWW) and bifer (FER) (Fig. 1A), under mild conditions and with high yields. These exfoliated zeolites were then deposited onto substrates such as ITO glass and silicon wafers using spin-coating (Fig. 1B), spontaneous spreading, and electrostatic adsorption techniques.[1]   The deposition yielded compact, thin, and uniform zeolite films (Fig. 1C), which would be impractical or difficult to produce using conventional hydrothermal synthesis. The resulting films demonstrated the thickness of a single zeolite nanosheet (2-3 nm) and a high degree of uniformity. This thin layer is promising not only for its catalytic applications but also for its chemical resistance, corrosion protection, and potential use as a low-dielectric insulator in electronic devices.

Fig. 1. (A) Structure of the Bifer (FER) zeolite layer, (B) schematic illustration of the spin-coating deposition process, and (C) AFM image of the deposited zeolite film on a silicon substrate showing the film with predominant thickness of a single Bifer layer.

Reference

  1. N. Sakai, T. Sasaki, Acc. Mater. Res. 5, 752−760 (2024), DOI 10.1021/accountsmr.4c00072
  2. W.J. Roth, M. Opanasenko, M. Mazur, B. Gil, J. Čejka, T. Sasaki, Adv. Mater. 36, 2307341 (2024), DOI 10.1002/adma.202307341