A25：TOF-SIMSNanoGREEN Bldg. E-102
|
Maker |
ION-TOF GmbH |
|---|---|
|
Model |
TOF.SIMS5-AD-GCIB |
|
Use for |
Detection and identification of trace elements/compounds on the surface, depth profiling, and imaging with the sub-micron lateral resolution |
|
Outline |
High sensitivity can be realized by mass spectrometry of secondary ions emitted by ion sputtering. Information on the molecular structure of organic compounds can be obtained under the static SIMS condition. Molecular depth profiling is possible with lower damage by using an Ar gas cluster ion beam (GCIB). |
Specification
|
The beam spot size |
100nm (Imaging mode) |
|---|---|
|
Mass resolution |
M/ΔM＞10000 (Spectroscopy mode) |
|
Ultimate vacuum |
＜6.7x10-8Pa |
|
Ar-GCIB |
Beam energy:2～20kev, Cluster size:Ca.2500 |
|
Flooding |
O2 or Ar is available (Pressure automatically controlled) |
|
Heating and cooling systems |
-130～600℃(The sample stage with heating and cooling systems) |
|
Unexposing the sample to ambient air. |
Transfer vessel is available |
Notice
- Samples containing conductive nanoparticles cannot be measured.
- Layered samples with materials of different conductivities are very difficult to measure.
- No licenses are issued for this sensitive equipment.
- A non-air-exposed transfer vessel is provided; however, its airtightness is limited and cannot be guaranteed for sensitive samples.
- As this is an ultra-high vacuum instrument, samples containing volatile components that may contaminate the chamber cannot, in principle, be measured. Please consult us in advance regarding such samples. Samples containing sulfides cannot be measured.
