A18：XPSNanoGREEN Bldg. E-505

Maker	ULVAC-PHI
Model	PHI 5000 VersaProbe II
Use for	Surface-sensitive qualitative and quantitative analysis of elemental composition and oxidation states of surface species.
Outline	This system is capable of determination of the elemental composition and oxidation state of surface species by analyzing photoelectrons emitted by X-ray excitation. A monomer Ar ion gun and gas cluster ion gun (GCIB) are available for depth-resolved analysis. Samples can be introduced from an inert environment into the vacuum chamber by transfer vessel.

Min. X-ray beam	micro-focused scanning x-ray source (Al Kα; 1486.6 eV, spot size; 10-300 mm) un-focused dual anode x-ray source (Mg Kα; 1254 eV and Zr Kα; 2042.4 eV
Minimum X-ray beam diameter	≤ 10 µm
Max.energy resolution	0.5eV >（Ag3d 5/2）
High sensitivity	1,000kcps（Ag3d 5/2，FWHM 1.0eV）
Degree of vacuum	6.7x10^-8Pa≥
Arion gun and Ar gas cluster ion gun(GCIB)	Ar⁺ ion and Ar₂₅₀₀⁺ cluster ion sources
Sample stage	Cooling/heating 5-axis tilt stage
Transportation	Non-atmospheric exposure analysis is available with transfer-vessel.

As this is an ultra-high vacuum instrument, samples containing volatile components that may contaminate the chamber cannot, in principle, be measured. Please consult us in advance regarding such samples. Samples containing sulfides cannot be measured.