第76回先端計測オープンセミナー

開催日: 2016.04.18 終了


日時

2016年4月18日 (月) 10 : 30~11 : 30

場所

国立研究開発法人 物質・材料研究機構 千現地区 研究本館管理棟 1階 第2会議室
交通案内 →こちら

参加方法及びお問合わせ

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講演者

Chris Park (Carl Zeiss Microscopy GmbH)

講演要旨

Pushing Research Frontiers with Helium and Neon Ion Microscopy & Nanofabrication

 Combining a high brightness Gas Field Ion Source (GFIS) with unique sample interaction dynamics, helium and neon ion microscopy provide nanomachining capabilities in the sub-10 nm regime and offer new and complementary insights into the structure and function of nanomaterials. Besides imaging, the helium ion beam can be used for fabricating nanostructures at the sub-10nm length scale. The neon probe size is greater than helium and is measured between 1-2nm. The sputter yield of Ne is about 30X higher than He, and the Ne beam has a shallower penetration depth resulting in lower sub-surface damage. Inert by nature and with a moderate sputtering rate, the neon ion beam presents an attractive alternative to  Ga+ FIB for use in applications sensitive to Ga+ implantation and structural damage.  In addition to Helium and Neon beams, the Orion NanoFab multi-ion beam platform comes with the option of a state-of-the-art Ga FIB for a versatile nanomachining workstation.
 Helium and neon ion microscopy is moving to the forefront as a technology for maskless nanopatterning of 2D materials such as graphene. The helium ion beam has smaller interaction volume and higher surface sensitivity than an FESEM, and is an ideal tool for visualizing single layer sheets. In addition, the helium ion beam provides unparalleled precision for direct-write nanolithography due to a sub-nanometer spot size, minimal surface scattering, and low proximity effects. This talk will focus on application examples of how helium and neon ion beams are being used to push the boundaries of materials engineering research.


イベント・セミナーデータ

イベント・セミナー名
第76回先端計測オープンセミナー
会場
国立研究開発法人 物質・材料研究機構 千現地区 研究本館管理棟 1階 第2会議室
開催日: 時間
2016.04.18
10:30-11:30
参加料
無料

お問合わせ

国立研究開発法人 物質・材料研究機構 先端材料解析研究拠点

Tel:029-851-3354 内線3861
Fax:029-859-2801
E-Mail: amc=ml.nims.go.jp([ = ] を [ @ ] にしてください)
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