Nano Electronics Device Materials Group

2023.04.01 Update

Nanoelectronics materials have been applied to various new devices for IoT, electric vehicle and so on. For these applications, demands of high reliability, high-speed operation, and high power are increasing. In this field, our group is focusing on thin film dielectric materials, and developing new thin film dielectric materials for next generation high speed/power devices. In addition, the applications of dielectric material are very diverse such as capacitor, insulator and memory devices. For new material design, we need to consider the combination of materials and applications, and are trying to introduce the materials informatics into our thin film materials development scheme.

Approach

To accelerate the thin film material development, we are combining our combinatorial material synthesis/evaluation technologies, which are the high-speed thin-film material synthesis technologies that have been developed up to now, and materials informatics including the multipoint analysis, database, and computational science. In addition, in the device application of new materials, the interface properties affect the physical and electrical properties. To understand and control the interface properties, our group developed operando measurements. That is bias application photoelectron spectroscopy. This technology has elucidated the electronic and defect structures of various interfaces. Using these nanoscale interface evaluation methods, we will verify the basic device structure of the new materials obtained in high-throughput material development, and perform verification and problem solving for new device applications.




[Facilities for synthesis and fabrication]

Combinatorial Pulse Laser Deposition (Combi-PLD)
Combinatorial Ion-Beam Sputtering and Molecular Beam Epitaxy system (Combi-IBS/MBE)
Combinatorial Multi-target Sputtering system (Combi-sputter)
Rapid thermal annealing system (RTA)
Gas flow controlled furnace
Plasma treatment system




[Facilities for characterization and measurements]

2 dimensional X-ray Diffraction system (2D-XRD)
Multifunctional Atomic Force Microscope
 (Kelvin force, piezoelectric response, dielectric response, electrical resistance evaluation)
Hall Effect Measurement system
Semi-auto probing system
Variable temperature probing system 10~700 K
Semiconductor Parameter Analyzer, Impedance Analyzer, Network Analyzer
X-ray fluorescence spectrometer High resolution scanning electron microscope
Workstations and software :




Inquiry about this page

Nano Electronics Device Materials Group
1-1 Namiki, Tsukuba, Ibaraki, 305-0044 JAPAN
TEL: +81-29-860-4546
E-Mail: NAGATA.Takahiro=nims.go.jp(Please change "=" to "@")