形状記憶合金薄膜に関する論文と解説

（著書）　

　• 石田章：「形状記憶合金」, 環境・エネルギー材料ハンドブック（オーム社
　　2011）p. 384-392

　.• A. Ishida: “Mechanical properties of TiNi thin films”, Thin Film Shape Memory　
　 　Alloys (Cambridge University Press 2009) p. 145-165 .

• A. Ishida: “Shape-Memory Alloy Thin Films”, Comprehensive Microsystems (Elsevier 2007) p. 61-70.

• 石田章：「形状記憶合金」, MEMS/NEMSの最先端技術と応用展開 (フロンティア出版2006) p. 55-61 .

• 石田章、佐藤守夫：「薄膜型アクチュエータ材料化技術」, 未来型アクチュエータ材料・デバイス（シーエムシー出版2006) p. 124-131.

• 石田章：「形状記憶合金薄膜への応用」, 赤外線加熱工学ハンドブック（アグネ技術センター2003) p. 187-190.

• 石田章：「スパッタリング」, 表面処理工学－基礎と応用（表面技術協会編、日刊工業新聞社2000）p. 135-137.

• 石田章：「スパッタリング」, 表面技術便覧（表面技術協会編、日刊工業新聞社1998）p.774-780.

• 石田章：「マイクロマシンを動かす形状記憶合金薄膜」, 身近な機能膜のはなし－ドライプロセステクノロジー（日刊工業新聞社1994) p.86-92.

（解説）

• 石田章：「形状記憶合金薄膜の応用展開」, 金属 81(2011) 315-320

• 石田章：「Ti-Ni系形状記憶合金薄膜の微細組織と機械的挙動」軽金属 57(2007)293-300.

• 石田章：「形状記憶合金薄膜のマルチフェロイクスへの展開」金属 76 (2006)54-57.

• 石田章、澤口孝宏、佐藤守夫：「形状記憶合金薄膜とその応用」金属 74(2004)145-149.

• A. Ishida, V. Martynov: “Sputter-Deposited Shape-Memory Alloy Thin Films: Properties and Applications” MRS Bull. 27(2002)111-114.

• 石田章：「形状記憶合金薄膜アクチュエーター」工業材料49(2001)46-49.

• 石田章：「形状記憶合金薄膜の研究と今後の展望」まてりあ 40(2001)44-51.

• 澤口孝宏、佐藤守夫、石田章：「形状記憶合金スパッタ膜－最近の話題」表面技術 52(2001)76-77.

• S. Miyazaki, A. Ishida: “Martensitic Transformation and Shape Memory Behavior in Sputter-Deposited TiNi-base Thin Films” Mater. Sci. Eng. A273-275(1999)106-133.

• 宮崎修一、石田章：「強力大変位マイクロアクチュエータ材料－Ti-Ni系形状記憶合金薄膜」まてりあ 38(1999)279-280.

• A. Ishida, S. Miyazaki: “Microstructure and Mechanical Properties of Sputter-Deposited Ti-Ni Alloy Thin Films” J. Eng. Mater. Technol.-Trans. ASME 121(1999)2-8.

• 石田章、宮崎修一：「形状記憶合金薄膜」表面技術 47(1996)1029-1030.

• 石田章、武井厚、宮崎修一：「形状記憶合金薄膜」表面技術　46(1995)628-631.

（論文）
　・"A novel lattice correspondence of B19→B19' transformation in Ti-Ni-Cu
　　shape memory alloy thin film", X.L. Meng, M. Sato, A. Ishida, Phil. Mag. Lett.

　・"Structure of martensite in deformed Ti-Ni-Cu thin films", X.L. Meng, M. Sato,
　 A. Ishida, Acta Mater. 59(2011)2535-2543.

　・"Two-way Shape Memory Effect and Mechanical Resonance Ptoperties of 　
　 Shape-Memory-Alloy-Coated Magnetic Ribbons", Y. Miyahara, O. Ishii, S.
　Kambe, N. Kutsuzawa, A. Ishida, J. Magn. Soc. Jpn., 34(2010)584-587.

　・"Formation of B19' martensite in annealed Ti44.6Ni40.1Cu15.3 thin films and
　 their shape recovery characteristic", Z.Y. Gao, M. Sato, A. Ishida, J. Alloys and
　 Compounds 505(2010)81-85

　・"Development of Polyimide/SMA Thin-film Actuator", A. Ishida, M. Sato, Mater
　. Sci. Forum 654-656(2010)2075-2078

• “Structure of martensite in sputter-deposited (Ni, Cu)-rich Ti-Ni-Cu thin films containing Ti(Ni, Cu)₂ precipitates”, X. L. Meng, M. Sato, A. Ishida, Acta Mater. 57 (2009)1525-1535.

• “Shape memory behavior of annealed Ti_48.5Ni_(51.5-x)Cu_x (x=6.2-33.5) thin films”, A. Ishida, M. Sato, Phil. Mag. 88(2008)2439-2448.

• “Microstructure of annealed Ti_48.5Ni_(51.5-x)Cu_x (x=6.2-33.5) thin films”, A. Ishida, M. Sato, K. Ogawa, Phil. Mag. 88 (2008) 2427-2438.

• “Influence of Ti₂Cu precipitates on B19 martensite structure in a Ti-rich Ti-Ni-Cu thin film”, X. L. Meng, M. Sato, A. Ishida, Phil. Mag. Lett. 88 (2008) 575-582.

• “Ti-Ni-Cu shape-memory alloy thin film formed on polyimide substrate”, A. Ishida, M. Sato, Thin Solid Films, 516 (2008) 7836-7839.

• “Structure of martensite in Ti-rich Ti-Ni-Cu thin films annealed at different temperatures”, X. L. Meng, M. Sato, A. Ishida, Acta Mater. 56 (2008) 3394-3402.

• “Transmission electron microscopy study of the microstructure of B19 martensite in sputter-deposited Ti_50.2Ni₃₀Cu_19.8 thin films”, X. L. Meng, M. Sato, A. Ishida, Scripta Mater. 59 (2008) 451-454.

• “Microstructure and shape memory behavior of annealed Ti-36.8at.%Ni-11.6at.%Cu thin film”, A. Ishida, M. Sato, K. Ogawa, Mater. Sci. Eng. A 481-482 (2008) 91-94.

•「超小型触覚ディスプレイ用垂直駆動SMA薄膜アクチュエータの設計」吉川弥、篠部晃生、菅野公二、土屋智由、石田章、田端修, IEEJ Trans. SM, 128 (2008) 151-160.

• “Microstructure and shape memory behaviour of annealed Ti_51.5Ni_(48.5-x)Cu_x (x=6.5-20.9) thin films”, A. Ishida, M. Sato, Phil. Mag. 87 (2007) 5523-5538.

• “Graphical design for thin-film SMA microactuators”, A. Ishida, M. Sato, W. Yoshikawa, O. Tabata, Smart Mater. Struct. 16 (2007) 1672-1677.

• “Shape memory behavior of Ti-Ni-Cu thin films”, A. Ishida, M. Sato, K. Ogawa, K. Yamada, Mater. Sci. Eng. A 438-440 (2006)683-686.

• “Microstructure and shape-memory behavior of annealed Ti_51.5Ni_33.1Cu_15.4 thin films”, A. Ishida, M. Sato, K. Ogawa, Phil. Mag. Lett. 86(2006)13-20.

• “Deformation mechanism of martensite in Ti-rich Ti-Ni shape memory alloy thin films”, J. X. Zhang, M. Sato, A. Ishida, Acta Mater. 54 (2006) 1185-1198.

• “Shape memory thin films formed with carrousel-type magnetron sputtering apparatus”, A. Ishida, M. Sato, O. Tabata, W. Yoshikawa, Smart Mater. Struct. 14(2005)S216-S222.

• “A study of amorphous Ti-Ni alloys by X-ray photoelectron spectroscopy”, M. A. Seabolt, W. R. Ogden, A. R. Chourasia, A. Ishida, J. Electron Spectrosc. 135 (2004) 135-141.

• “High temperature shape memory effects in ternary Ti-Ni-X (X=Pd, Zr) thin films”, T. Sawaguchi, M. Sato, A. Ishida, Trans. Mater. Res. Soc. Japan 29(2004)2977-2980.

• “The effect of two types of precipitates upon the structure of martensite in sputter-deposited Ti-Ni thin films”, J. X. Zhang, M. Sato, A. Ishida, Smart Mater. Struct. 13 (2004)N37-N42.

• “Grain-size effect on shape-memory behavior of Ti_35.0Ni_49.7Zr_15.4 thin films”, T. Sawaguchi, M. Sato, A. Ishida, Metall. Mater. Trans. A 35A(2004)111-119.

• “Martensite structure in Ti-rich Ti-Ni thin films”, A. Ishida, J. X. Zhang, J. Phys. IV 112(2003) 849-852.

• “Thickness effect on shape memory behavior of Ti-50.0at.%Ni thin film”, A. Ishida, M. Sato, Acta Mater. 51(2003)5571-5578.

•“On the Ti₂Ni precipitates and Guinier-Preston zones in Ti-rich Ti-Ni thin films”, J. X. Zhang, M. Sato, A. Ishida, Acta Mater. 51 (2003) 3121-3130.

• “Microstructure and shape memory behavior of Ti_51.2(Pd_27.0Ni_21.8) and Ti_49.5(Pd_28.5Ni_22.0) thin films”, T. Sawaguchi, M. Sato, A. Ishida, Mater. Sci. Eng. A332 (2002)47-55.

• “Bimorph-type microactuator using TiNi shape-memory thin film”, A. Ishida, M. Sato, W. Yoshikawa, O. Tabata, Mater. Sci. Forum 394-395(2002)487-490.

• “Sputter-deposited TiZrNi high-temperature shape-memory thin films”, T. Sawaguchi, M. Sato, A. Ishida, Mater. Sci. Forum 394-395(2002)499-502.

• “Influence of Guinier-Preston zones on deformation in Ti-rich Ti-Ni thin films”, J. X. Zhang, M. Sato, A. Ishida, Phil. Mag. Lett. 82 (2002) 257-264.

• “Structure of martensite in sputter-deposited Ti-Ni thin films containing homogeneously distributed Ti₂Ni precipitates”, J. X. Zhang, M. Sato, A. Ishida, Phil. Mag. A 82(2002)1433-1449.

• 「Ti-Niスパッタ膜の超弾性」, 佐藤守夫、石田章, 表面技術 53(2002)267-272.

• “Ti-Pd-Ni high temperature shape memory thin films formed with carousel type magnetron sputtering apparatus”, T. Sawaguchi, M. Sato, A. Ishida, J. Phys. IV 11(2001)Pr8-427-432.

• “Shape memory behavior of Ti-rich Ti-Ni thin films formed by sputtering”, A. Ishida, T. Sawaguchi, M. Sato, J. Phys. IV 11(2001) Pr8-409-414.

• “Structure of martensite in sputter-deposited Ti-Ni thin films containing Guinier-Preston zones”, J. X. Zhang, M. Sato, A. Ishida, Acta Mater. 49 (2001)3001-3010.

• “Effects of composition and annealing on shape memory behavior of Ti-rich Ti-Ni thin films formed by sputtering”, A. Ishida, M. Sato, T. Kimura, T. Sawaguchi, Mater. Trans. 42 (2001) 1060-1067.

• 「Ti過剰Ti-Ni合金薄膜の形状記憶特性に及ぼす組成および熱処理の効果」, 佐藤守夫、木村隆、澤口孝宏、石田章, 日本金属学会誌 64(2000)62-66.

• “Stress-strain curves of sputter-deposited Ti-Ni thin films”, A. Ishida, M. Sato, T. Kimura, S. Miyazaki, Phil. Mag. A 80(2000)967-980.

• “Mechanical properties of Ti-Ni shape memory thin films formed by sputtering”, A. Ishida, M. Sato, S. Miyazaki, Mater. Sci. Eng. A273-275(1999)754-757.

• “Texture and shape memory behavior in sputter-deposited Ti-Ni thin films”, V. H. No, S. Miyazaki, A. Ishida, P. Sittner, Proc. of Plasticity-99, The seventh International Symposium on Plasticity and its Current applications, Cancun, Mexico (1999)255-258.

• “Two-way shape memory effect of sputter-deposited thin films of Ti51.3at.%Ni”, M. Sato, A. Ishida, S. Miyazaki, Thin Solid Films 315(1998)305-309.

•”Microstructure of Ti-48.2at.pct Ni shape memory thin films”, A. Ishida, K. Ogawa, M. Sato, S. Miyazaki, Metall. Mater. Trans. A 28A (1997)1985-1991.

• “Recent developments in sputter-deposited Ti-Ni-base shape memory alloy thin films”, S. Miyazaki, K. Nomura, A. Ishida, S. Kajiwara, J. Phys. IV 7(1997)C5-275-280.

• 「Ti-50at.%および52at.%Ni合金薄膜の形状記憶特性に及ぼす熱サイクルの影響」, 佐藤守夫、石田章、武井厚、宮崎修一, 表面技術 47(1996)229-234.

• “Martensitic transformations in sputter-deposited Ti-Ni-Cu shape memory alloy thin films”, S. Miyazaki, T. Hashinaga, A. Ishida, Thin Solid Films 281-282(1996)364-367.

• “Effect of aging on shape memory behavior of Ti-51.3at.pct Ni thin films”, A. Ishida, M. Sato, A. Takei, K. Nomura, S. Miyazaki, Metall. Mater. Trans. A 27A(1996) 3753-3759.

• “Stress-strain curves of sputtered thin films of Ti-Ni”, A. Ishida, A. Takei, M. Sato, S. Miyazaki, Thin Solid Films 281-282(1996)337-339.

• “Effect of heat treatment on shape memory behavior of Ti-rich Ti-Ni thin films”, A. Ishida, M. Sato, A. Takei, S. Miyazaki, Mater. Trans. JIM, 36(1995)1349-1355.

•“Effect of heat treatment on shape memory behavior of Ti-Ni thin films”, A. Ishida, M. Sato, A. Takei, Y. Kase, S. Miyazaki, J. Phys. IV 5(1995) C8-701-705.

• “Shape memory characteristics of sputter-deposited Ti-Ni thin films”, S. Miyazaki, A. Ishida, Mater. Trans. JIM 35(1994) 14-19.

• 「Ti-Ni形状記憶合金薄膜の変態温度に及ぼす熱サイクルの効果」, 佐藤守夫、石田章、武井厚、宮崎修一, 表面技術　45(1994) 1308-1309.

• “Shape memory thin film of Ti-Ni formed by sputtering”, A. Ishida, A. Takei, S. Miyazaki, Thin Solid Films 228(1993)210-214.