1999〜2003
論文
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P. K. Song, Y. Shigesato, M. Kamei, I. Yasui “Electrical and Structural Properties of Tin-doped Indium Oxide Films Deposited by DC Supttering at Room Temperature ” Japanese Journal of Applied Physics 38 (5A) 2921-2927 (1999). |
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P. K. Song, H. Akao, M. Kamei, Y. Shigesato, I. Yasui “Preparation and Crystallization of Tin-doped and Undoped Amorphous Indium Oxide Films Deposited by Sputtering” Japanese Journal of Applied Physics 38, 5224-5226 (1999). |
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T. Futagami, M. Kamei, I. Yasui,
Y. Shigesato, N. Sugimoto, and Y. Hayashi,
"Persistent spectral hole burning in samarium and aluminum codoped silica films prepared by RF sputtering," J. Ceram. Soc. |
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T. Futagami, M. Kamei, I. Yasui,
N. Sugimoto, and Y. Hayashi, and A. Hayashi, "Photoluminescence of
samarium-doped aluminosilicate thin films deposited
by rf sputtering with a ceramic target," J. Ceram. Soc. |
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Hidetoshi Miyazaki, Masayuki Kamei, Yuzo Shigesato* and Itaru Yasui “Influence of unbalanced magnetron and Penning ionization for rf reactive magnetron sputtering”. Jpn. J. Appl. Phys. Vol.38(1999) 186-191. |
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Hidetoshi Miyazaki, Masayuki Kamei, and Itaru Yasui “Vanadium oxide thin films deposited onto Cu buffer layer by RF magnetron sputtering” Thin Solid Films 343 / 344, 168 (1999). |
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Fumio
Kawamura, Masayuki Kamei, and Itaru Yasui “Effect of Impurity Cations
on the Growth and Habits of SnO2 |
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Hidetoshi Miyazaki, Hiroyasu Sakamura, Masayuki Kamei, and Itaru Yasui “Electrochemical evaluation of oriented vanadium oxide films deposited by reactive rf magnetron sputtering” Solid State Ionics 122, 223-229 (1999). |
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Yuzo Shigesato, Naoko Shin, Masayuki Kamei, P. K. Song and Itaru Yasui “Study on fluorine-doped indium oxide films deposited by RF magnetron sputtering”, Jpn. J. Appl. Phys. 39, 6422-6426 (2000). H12-a00257 |
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Naoaki Taga, Yuzo Shigesato and Masayuki Kamei “Electrical properties and surface morphology of heteroepitaxial-grown tin-doped indium oxide thin films deposited by molecular beam epitaxy” Journal of Vacuum Science and Technology A, 18 (4) 1663-1667 (2000).
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M. Kamei, H. Akao, P. K. Song and I. Yasui “Crystallization and electrical properties of doped and undoped indium oxide films” The Korean Journal of Ceramics 6 (2) 107-109 (2000). |
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F. Utsuno, N. Yamada, M. Kamei and I. Yasui “Tin doping mechanism in indium oxide by MD simulation” The Korean Journal of Ceramics 5 (1) 40-43 (1999). |
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P. K. Song, M. Kamei, |
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Masayuki Kamei and Takefumi Mitsuhashi “Hydrophobic drawings on hydrophilic surfaces of single crystalline titanium dioxide -Surface wettability control by mechanochemical treatment-“,Surface Science Letters 463, L609-L612 (2000). |
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Masayuki Kamei*, Hiromi Enomoto and Itaru Yasui “Origin of Crystalline Orientation Dependent Doping Efficiency in Tin-Doped Indium Oxide Films” Thin Solid Films 392, 265-268 (2001). |
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Takahira Miyagi, Tomoyuki Ogawa, Masayuki Kamei, Yoshiki Wada, Takefumi Mitsuhashi, Atsushi Yamazaki, Eiji Ohta and Tetsuya Sato ”Deep level transient spectroscopy analysis of an anatase epitaxial film grown by metal organic chemical vapor deposition” Japanese Journal of Applied Physics 40, L404-L406 (2001). |
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Masayuki Kamei, Takahira Miyagi, Tomoyuki Ogawa, Takefumi Mitsuhashi, Atsushi Yamazaki and Tetsuya Sato ”Comparative study of anatase epitaxial thin films grown by magnetron sputtering and metal organic chemical vapor deposition” Jpn. J. Appl. Phys. Vol. 42 (2003) 7025-7028. |
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Takahira Miyagi, Masayuki Kamei, Takefumi Mitsuhashi, Atsushi Yamazaki “Superior Schottky electrode of RuO2 for deep level transient spectroscopy on anatase TiO2” Applied Physics Letters 83 (9), 1782-1784 (2003). |
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Takahira Miyagi, Masayuki Kamei, Tomoyuki Ogawa, Takefumi Mitsuhashi, Atsushi Yamazaki, and Tetsuya Sato “Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering” Thin Solid Films 442, 32-35 (2003). |
取得特許
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登録番号 |
特許内容 |
備考 |
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US6338877 B1、Jan. 15,2002Att's Docket no. 0200-0070-0, class-subclass: 427-444-0, Batch no.N24, |
Masayuki Kamei and Takefumi Mitsuhashi, 米国特許：US6338877 B1、Jan. 15, 2002Att's Docket no. 0200-0070-0, class-subclass: 427-444-0, Batch no.N24, Appln. Type: utility "Method for rapidly imparting hydrophobicity to a hydrophilicity imparted oxide solid surface". (2002年) |
米国特許 |
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特許第3463246号 |
亀井雅之、三橋武文「光触媒効果を利用したリフトオフ法によるパターン形成方法」、2003年8月22日登録 |
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