Under the Nanotechnology Support Project which took place for five years from 2000, we have provided user support services to more than 380 nanotechnology researchers and 250 themes. Our supports are observation by electron microscope, sample preparation and analysis. The supports are done by three groups centering around three electron microscopes. This is the only place in the world where a nanotechnology researcher can access multiple cutting edge electron microscopes in one place and efficiently gain research result through efficient method. We will provide services with dual-ion beam interfaced high-voltage electron microscope, high-resolution high-voltage electron microscope, and atom-discriminating electron microscope in the same way under new Nanotechnology Network sported by MEXT （Ministry of Education, Culture, Sports, Science and Technology）, Japan.
High Voltage Electron Microscopy Station
High Voltage Electron Microscopy Station provides state of art electron microscopy techniques by researchers expertise in electron microscopy, instruments and method for research oriented themes from sample preparations to the analysis of the results.
Kazuo FURUYA
Dual-ion beam interfaced high-voltageKazutaka MITSUISHI
High-resolution high-voltageYoshio MATSUI
Atom-discriminatingMasanori MITOME
Dual-ion beam interfaced high-voltage electron microscope
Dual ion beam interfaced high-voltage TEM
- Accelerating voltage of 1000 kV, point resolution of 0.13 nm and lattice resolution of 0.10 nm.
- With dual ion source connected.
- In-situ irradiation experiment is possible at various conditions. EDS and EELS are also equipped.
(a) HAADF-STEM image and (b)corresponding simulated image of Zn7Sb2O12 spinel at twin-boundary, indicating smaller concentration of Sb at boundary.
High-resolution high-voltage electron microscope
High-Resolution UHV TEM
Ultra-high-resolution, high-voltage electron microscope achieved point-resolution of 0.1nm in 1990, which was the world record at that time. High-resolution atom imaging is available at 400-1300kV, and the images can be recorded on EM-films, imaging plates (IP), and also dynamically by the CCD camera.
HRTEM data of superconducting material CoSr2YCu2O7.0 (a) and the structure model (b)
Atom-discriminating electron microscope
Atom-discriminating electron microscope
Atom-discriminating electron microscope is equipped with OEMGA-type energy filter in the microscope column. It is possible to observe elemental distribution images with the resolution of 0.5nm.
Cr element mapping of Zn0.95>Cr0.05Te thin film.
Inquiry
High Voltage Electron Microscopy Station, NIMS
1-1 Namiki, Tsukuba, Ibaraki 305-0044, JAPAN
E-Mail： em_nims[AT]nims.go.jp(replace "[AT]" with "@")