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  Group introduction
 
Group Leader’s Greeting
統括マネージャー 小出康夫
Group Leader
Yasuo Koide
A mission of the Nano-Fabrication and Characterization Facility (NFCF) of the Interdisciplinary laboratory for Nanoscale Science and Technology (INST) is to create the innovation by providing advanced nanotechnology and micro-fabrication facilities and technical assistance for academia, industry, and government researchers.

The NFCF was launched at NIMS in FY2007 and had a 450-m2 clean room facility consisted of seven rooms for each process; the process characterization, the film-deposition, the dry-etching, the thermalannealing, the exposure & development, the photolithography, and the electron & laser beam lithography areas.
This facility has the advanced nano-scale observation, measurement, and characterization systems and gives supports of three-dimensional fabrication with nanometer-to-millimeter scale for a variety of materials, such as semiconductor, oxide, dielectric, magnetic, and metallurgy, and composite materials with the aid of professional staffs.

Furthermore, the NFCF extensively promotes an interdisciplinary fusion research between natural and life sciences and collaboration among academia, industry, and government institute. Mutual exchanges among academia, industry, and government researchers in different fields will lead new perspective and unexpected discovery and innovation.
 
Outline of Facilities
Thin film deposition area (Class1000)
Dry etching area (Class1000)
Thin film deposition area (Class1000)
 
Dry etching area (Class1000)
Process characterization area (Class1000)
 
Yellow room(Class100)
Process characterization area (Class1000)
 
Yellow room(Class100)
Facilities
Clean room (450m2) and non-clean room laboratory
Clean room facility consists of seven rooms for each process.
 
– Class 100(110m2): Electron beam & laser lithography, Photolithography, and Resist processing areas
– Class 1000(200m2): Film deposition, Thermal annealing, and Dry etching areas
– Class 10000(80m2): Process characterization area
Non-clean room laboratory is for device characterization, cutting, and polishing process.
   
Materials
Compound Semiconductors, Silicon, Oxide, Magnetic, Metal materials
   
Functions
Photonic Crystals, Nano photonics, Nano carbons etc.
   
Main equipments
Electron beam & laser lithography, ICP-RIE, Bosch, W-beam FIB etc.
   
Members
Staff
Group Leader
Yasuo KOIDE, Dr.
Senior Researcher
Yoshimasa SUGIMOTO, Dr.
Senior Engineer
Naoki IKEDA, Dr.
Senior Engineer
Daiju TSUYA, Dr.
Post Doctoral & Technical Staff
NIMS Postdoctoral Researcher
EiichiroWATANABE, Dr.
NIMS Adjunct Researcher
Kiyomi NAKAJIMA
Contract Technical Staff
Masayuki OCHIAI
Contract Technical Staff
Hirotaka OOSATO
Contract Technical Staff
Contract Technical Staff
Etsuko URISAKA
Contract Technical Staff
Shushi HAMADA
Contract Technical Staff
Shuntaro TANIGAWA
 
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