Thin Film Processing Instrument

Thin Film Processing Instrument

Ultra High Vauum Cluster-type Sputtering Deposition System

Ultra High Vauum Cluster-type sputtering deposition system
(10-source revolver cathode chamber, 8-source co-sputtering chamber, oxidation chamber)

 UHV sputtering deposition system which has two sputtering chambers connected by the transfer chamber. Maximum 18 source can be deposited without air exposure in this system. High quality giant magnetoresistive device made by this system successfully realized the highest record of magnetoresistive property in the world.
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