Microfabrication Equipments

 The electron beam lithography, which focus the highly accelerated electron and draw nano-scale pattern on resists, is an indispensable tool for testing new spintronics materials in actual device scale. Our equipment, JBX-6300 SM, can easily draw wire patterns down to 7 nm in width, due to the benefit of the highly acceleration voltage upto 100 kV. Fine correction functions enables semi-automatic exposure with high accuracy.