Nanofabrication scanning electron microscope (Nanofab-SEM)
Electron beam induced deposition (EBID) is a method to fabricate nanometer-sized structures locally using dissociation process of precursor gases by electron beams. To perform EBID precisely, it is required to use a field emission gun (FE-gun) which can generate very focused beams. At the same time, ultrahigh vacuum (UHV) environment is necessary to eliminate the effect of contamination.

The nanofab-SEM is a bakeable SEM with a FE-gun and a gas deposition gun which can supply the precursor gases at the sample position. It enables nanofabrication of the sizes of 10nm by EBID, and has achieved the formation of 3 dimensional structures.
Specifications

Ultrahigh vacuum field emission scanning electron microscope; UHV-FE-SEM
- resolution: 1.5nm (accelerating voltage 15kV), 5.0nm (1kV)
- magnification: 20-500,000
- pressure: 5x10E-7Pa
- ZrO/W Shchottky type field emission gun
(accelerating voltage 0.5-30kV, probe current 0.01-200nA)
- working distance:24±4mm
- stage: X、Y　±10mm、Z　±6mm、tilt　0〜90°、rotation　360°
- gas deposition gun: inner-diameter of the nozzle 0.2mm
Fig. 1 A photograph of the nanofab-SEM
Fig. 2 Nanostructures fabricated by EBID from Fe(CO)5 on a carbon film