Surface Characterization Group
Most of the physical properties and novel functionalities of materials are manifested in surface, interface and sub-surface regions under specific environments. In the case of material synthesis, environments such as vacuum, atmosphere, molecular beam, plasma, photon, and so on are used. Various processes such as nanofabrication, thin film growth, oxidation and reduction, etching, and so on are occurring at surfaces and in the neighborhoods. Therefore, the state of the art characterization technologies are needed in order to fundamentally understand the topmost surfaces and sub-surfaces, which play a key role of material characteristics. In this group, development of the advanced surface characterization technologies is carrying out in order to understand structures, states, physical properties, functionalities, and reactions at surfaces. We are developing the surface-sensitive multifunction nanoprobes combined with extreme environments to clarify the structure and the feature of the low-dimensional nanostructures. Moreover, it is carrying forward the development of ultrafast characterization technology which has a temporal resolution in femto second to clarify basic physical properties such as carrier transport and interaction with lattice phonons in the sub-surface regions.
