Development of CPP-GMR devices using Heusler alloys
Large tunneling magnetoresistance (TMR) values reported from the magnetic
tunneling junctions (MTJs) using Co2FeAl0.5Si0.5 (CFAS) [1] and Co2MnSi (CMS) Heusler alloys [2] indicate high spin polarization of the electrode
materials. Highly spin polarized materials are believed to be effective
also for enhancing current-perpendicular-to-plane giant magnetoresistance
(CPP GMR). Because of its intrinsically low resistance compared to TMR,
CPP GMR has a potential as read heads applications in hard disk drives
with the recording density over 1 Tbits/inch2. Thus, it is a critical issue for CPP-GMR devices to realize high MR ratios
with low resistance. In this work, we are developing high MR ratios ΔR/R
in CPP-type spin valves using Heusler alloys of CFAS and CMS.
Structure and MR characteristics of epitaxial layers of CFAS/Ag/CFAS [3]
and CMS/Cu/CMS. Multilayered films were grown by dc and rf magnetron sputtering.
The films were deposited on MgO (001) single crystalline substrates kept
at room temperature. The films for CPP-GMR devices using CFAS have the
stacking structure of Cr(10)/Ag(200)/CFAS(20)/Ag(5)/CFAS(5)/Co75Fe25(2)/Ir22Mn78(10)Ru(8), where the numbers indicate the thicknesses in nm. The films
were microfabricated by electron beam lithography to form pillars with
submicron sizes for measuring the resistance in the CPP geometry. Then
the samples were annealed at 250 °C in the magnetic field of 5 kOe for
attaining the exchange bias by the IrMn layer. It has been reported that
the MR ratio of MTJs is strongly enhanced by improving the structural ordering
of the CFAS layers. Thus, three samples with different annealing conditions
were prepared for examining the effects of annealing CFAS layers: (A) no
annealing, (B) annealing only the lower CFAS layer at 400 °C after deposition,
and (C) annealing both CFAS layers at 400 °C. The structure of sample (B)
was closely examined by cross sectional TEM. Epitaxial growth of the layers
up to the top CFAS layer in the [001] direction was confirmed. The bottom
CFAS layer was in the B2 ordered structure, while the top CFAS layer was
in the A2 disordered structure. The MR ratio was 3.4 % for (A), 6.9% for
(B) and 12.4% for (C) with the resistance area product of RA≈0.1 Ω(μm)2
for each sample.
Figure 1 shows the MR curves of sample (C). The MR ratio increased to 31%
at 12 K. The results suggest that the MR characteristic is improved by
improving the structural ordering of the CFAS Heusler alloy. We prepared
the stacking structure of Cr(10)/Ag(200)/Cr(10)/CMS(20)/Cu(4)/CMS(5)/Co75Fe25(2)/Ir22Mn78(10)/Ru(5) by combining CMS with the Cu spacer layer. The bottom
CMS layer was annealed at 350 °C after the deposition. The MR ratio of
8.6 % RA=0.16 Ω(μm)2 was observed. The MR ratio increased to 30.5 % at
7 K. Figure 2 shows the cross sectional TEM image of the film. The layers
up to the tom CMS layer were found to grow epitaxially in the [001] direction
despite of the large lattice mismatch of 9.7 % between CMS and Cu. A lot
of defects including lattice distortions and dislocations are observed
in the Cu layer. The deformation within the Cu spacer layer is considered
to accommodate the large lattice mismatch, thereby enabling the epitaxial
growth of the top CMS layer. We have shown that large CPP MR ratios were
obtained by using epitaxial layers of Heusler alloys of CFAS and CMS combined
with a spacer layer of Ag or Cu. The origin of the large CPP GMR at low
temperatures is obviously the half metallicity of CFAS and CMS. However,
the MR ratio significantly decreases with increasing the temperature to
RT similarly with MTJs using Heusler alloys. One possible explanation for
the temperature dependence of the spin polarization of the Heusler alloys
due to magnon excitations. The rather poor structural ordering may lead
to the narrow energy gap of the minority-spin band and this might enhance
the magnon excitation at room temperature. It would be still promising
to improve the MR characteristics by improving the structural order by
optimizing the preparing condition of the Heusler layers.

Figure The stacking structure of the CPP-GMR and its MR curves.
References
[1] N. Tezuka, N. Ikeda, S. Sugimoto, and K. Inomata, Appl. Phys. Lett.
89, 252508 (2006).
[2] Y. Sakuraba, M. Hattori, M. Oogane, Y. Ando, H. Kato, A. Sakuma, T.
Miyazaki, and H. Kubota: Appl. Phys. Lett. 88, 192508 (2006).
[3] T. Furubayashi, K. Kodama, H. Sukegawa, Y. K. Takahashi, K. Inomata
and K. Hono, Appl. Phys. Lett. 93, 122507 (2008).
[4] K. Kodama, T. Furubayashi, T. Nakatani, H. Sukegawa, K. Inomata and
K. Hono, J. Appl. Phys. in press, arXiv: 0811.3282.
Relevant Publiscations
Oscillatory antiferromagnetic interlayer
exchange coupling in
Co2Fe(Al0.5Si0.5)/Ag/Co2Fe(Al0.5Si0.5)
films and its application to trilayer magnetoresistive sensor
T. O. Nakatani,
S. Mitani, T. Furubayashi and K. Hono, Appl. Phys. Lett. 99, 182505
(2011).
Effect of NiAl underlayer and spacer on
magnetoresistance ofcurrent-perpendicular-to-plane spin valves using
Co2Mn(Ga0.5Sn0.5) Heusler alloy
N. Hase, T.
M. Nakatani, S. Kasai, Y. K. Takahashi, T. Furubayashi and K. Hono, J. Mag. Mag. Mater. (2011),
in press.
Large magnetoresistance in current-perpendicular-to-plane pseudo spin valve
using a Co2Fe(Ge0.5Ga0.5) Heusler alloy
Y.K.
Takahashi, A. Srinivasan, B. Varaprasad, A. Rajanikanth, N. Hase, T.M. Nakatani,
S. Kasai, T. Furubayashi and K. Hono, Appl. Phys. Lett. 98, 152501
(2011).
Low-temperature grown quaternary
Heusler-compound Co2Mn1-xFexSi films on
Ge(111)
S. Yamada, K. Hamaya, T. Murakami, B. Varaprasad, Y. K. Takahashi, A.
Rajanikanth, K. Hono, and M. Miyao, J. Appl. Phys. 109, 07B113
(2011).
Enhancement of
current-perpendicular-to-plane giant magnetoresistance by insertion of
Co50Fe50 layers at the
Co2Mn(Ga0.5Sn0.5)/Ag intervace
N. Hase, T.
M. Nakatani, S. Kasai, Y. K. Takahashi, and K. Hono, J. Appl. Phys. 109, 07E112
(2011)..
The effect of substitution of Fe with Cr on
the giant magnetoresistance of current-perpendicular-to-plane spin valves with
Co2FeSi Heusler alloy
H. S. Goripati, T. furubayashi, S. V.
Karthik, T. M. Nakatani, Y. K. Takahashi, and K. Hono, J. Appl. Phys. 109, 043901
(2011).
Interfacial resistance and spin-dependent
scattering in current-perpendicular-to-plane giant magnetoresistance using
Co2Fe(Al0.5Si0.5)/Ag/Co2Fe(Al0.5Si0.5)
pseuso spin valves
T. M. Nakatani, T. Furubayashi, and K. Hono, J. Appl. Phys. 109, 07B724
(2011).
Effect of the Number of Layers on
Determination of Spin Asymmetries in Curret Perpendicular-to-Plane Giant
Magnetoresistance
T. Taniguchi, H. Imamura, T. M. Nakatani, and K. Hono, Appl. Phys. Lett. 98, 042503
(2010).
Enhancement of the
current-perpendicular-to-plane giant magnetoresistance by insertion of
Co50Fe50 layers at
Co2Mn(Ga0.5Sn0.5)/Ag interface
N. Hase, T.
M. Nakatani, S. Kasai, Y. K. Takahashi and K. Hono, J. Appl. Phys. 108, 093916
(2010).
Current-perpendicular-to-plane spin valves
with a Co2MnGa0.5Sn0.5 Heusler alloy
N.
Hase, B. Varaprasad, T. M. Nakatani, H. Sukegawa, S. Kasai, Y. K. Takahashi, T.
Furubayashi and K. Hono, J. Appl.
Phys. 108, 093916 (2010).
Bulk and interfacial scatterings in current-perpendicular-to-plane giant
magnetoresistance with Co2Fe(Al0.5Si0.5) Heusler alloy layers and Ag spacer
T. Nakatani, T. Furubayashi, S. Kasai, H. Sukegawa, S. Mitani, and K. Hono,
Appl. Phys. Lett. 96, 212501 (2010).
Structure and transport properties of current-perpendicular-to-plane spin
valves using Co2FeAl0.5Si0.5 and Co2MnSi Heusler alloy electrodes
T. Furubayashi, K. Kodama, T. M. Nakatani, H. Sukegawa, Y. K. Takahashi,
K. Inomata, and K. Hono, J. Appl. Phys. 107, 113917 (2010).
Interlayer exchange coupling in Co2FeAl0.5Si0.5/Cr/Co2FeAl0.5Si0.5 trilayers
T. Furubayashi, K. Kodama, H. S. Goripati, Y. K. Takahashi, K. Inomata,
and K. Hono, J. Appl. Phys. 105, 07C305 (2009).
Current-perpendicular-to-plane giant magnetoresistance of a spin valve
using Co2MnSi Heusler alloy electrodes
K. Kodama, T. Furubayashi, H. Sukegawa, T. M. Nakatani, K. Inomata and
K. Hono, J. Appl. Phys. 105, 07E905 (2009).
Current-perpendicular-to-plane giant magnetoresistance in spin-valve structures
using epitaxial Co2FeAl0.5Si0.5/Ag/Co2FeAl0.5Si0.5 trilayers
T. Furubayashi, K. Kodama, H. Sukegawa, Y. K. Takahashi, K. Inomata, and
K. Hono, Appl. Phys. Lett. 93, 122507 (2008).
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