The energy compensated 3DAP equipped with the delay line detector manufactured by Oxford Nanoscience Ltd. was originally installed at NIMS in 2003. The chamber design was substantically modified from the previous series of NIMS energy compensated 3DAP to cope with the large flange size of the new Delay Line Detector released from Oxford Nanoscience Ltd.

In July 2007, this instrument was modified to a laser assisted energy compensated 3DAP. The laser used for this upgrade is Teem Photonics' Q-switched PowerChip Laser PNG-002025 with wave length of 532 n, maximum energy of 40 microJ, pulse width of 750 ps, repetition rate of 1 kHz. This laser is substantially chepaer than the femtosecond laser that we employed for the laser assisted wide angle 3DAP, so the voltage pused atom probe can be easily upgraded to laser mode without much expense (see P. Stender et al. Ultramicroscopy 107, 726 (2007)).