Okazaki International Symposium

This symposium will be held on Oct. 24 (Fri.) afternoon in memory of the late Professor Kiyoshi Okazaki of the Syonan Institute of Technology. He created new fields of electronic ceramics in Asian countries. The tentative program is as fellows.

Program (tentative) (One of four concurrent sessions)

14:00-14:10      A memory of Prof. K. Okazaki,

Prof. Noboru Ichinose, (Waseda Univ. Japan)

14:10-14:40      Large CaF2 single crystal for the next generation lithography by CZ method

                            Eiichi Nishijima (Tokuyama Corp., Japan)

14:40-15:10         Development and Industrialization of Fine Grain And High Crystalline

Barium Titanate Synthesized by Hydrothermal Reaction

T. Shikida, K. Abe, K. Hidaka, Y. Ikeda, and S. Ogama,

(Sakai Chemical Industry Co., LTD, Japan)

15:10-15:40      Crystallographic aspects of microwave dielectric properties

Prof. Hitoshi Ohsato, Isao, Kagomiya, Ken-ichi Kakimoto

(Nagoya Institute of Technology, Japan) and

Eiichi Koga (Panasonic Electronic Devices Hokkaido Co. Ltd., Japan)

15:40-16:00         Break

16:00-16:30       High frequency characteristic of elements substituted hexagonal ferrites

Prof. Nobuyuki Hiratsuka

(Graduate School of Science and Engineering, Saitama University)

16:30-17:00      Giant Dielectric Response and Relaxor-Like Behaviors in Perovskite and

Perovskite-Related Ceramics with Mixed-Valent Structure

Prof. Xiang Ming Chen, Lei Ni, and Zhuo Wang

(Zhejiang University, People’s Republic of China)

17:00-                  Group Photo